Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography

Abstract

Abstract. The digital pattern generator (DPG) is a complex electron-optical MEMS that pixelates the electron beam in the reflective electron beam lithography (REBL) e-beam column. It potentially enables massively parallel printing, which could make REBL competitive with optical lithography. The development of the REBL DPG, from the CMOS architecture, through the lenslet modeling and design, to the fabrication of the MEMS device, is described in detail. The imaging and printing results are also shown, which validate the pentode lenslet concept and the fabrication process.

W:Al2O3 Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition

“…The ALD W:Al 2 O 3 nanocomposite films have been utilized as tunable resistive films , where the film resistivity can be varied by orders of magnitude by adjusting the W cycle percentage. Tunable resistive films composed of both ALD W:Al 2 O 3 and Mo:Al 2 O 3 nanocomposite layers have been used to manufacture large area microchannel plates and electron optical MEMS devices. − To date, the optical properties of the ALD W:Al 2 O 3 nanocomposites have not been explored. However, these previous works showed that the metallic nanoparticle size in the composite material was extremely small (1–2 nm), ,, and this is a necessary condition to minimize optical scattering.…”

The Fabrication of Micro Beam from Photopolymer by Digital Light Processing 3D Printing Technology

“…MEMS technologies have been manufactured by traditional methods such as lithography, galvano forming, and photolithography etc. These methods are dependent on additive or subtractive procedures that operate minuscule capacities of materials in the shape of thin layers on the surface of silicon wafers [12][13][14][15][16]. These conventional techniques are extremely precise and appropriate for the production of planar geometries [17].…”