Room
temperature decomposition and thermal decomposition of dimethyl
methylphosphonate (DMMP), a chemical warfare agent (CWA) simulant,
on size-selected copper clusters have been studied via combined X-ray
photoelectron spectroscopy (XPS) and temperature-programmed desorption
(TPD). Cu100 and (CuO)80, which have the same
nominal masses, were chosen to present a direct comparison between
the reactivity of metallic copper and that of cupric oxide with DMMP.
Room temperature XPS results have shown that most of the DMMP molecules
decompose completely and reductively into atomic phosphorus on Cu100, while almost all the DMMP molecules are only dissociatively
adsorbed on (CuO)80 as methyl methylphosphonate (MMP).
XPS and TPD have been carried out to analyze the thermal decomposition
of adsorbed DMMP by identifying the surface species after annealing
to certain temperatures and the gaseous products evolved during linear
temperature ramps, respectively. Methanol, formaldehyde, and methane
are the three most significant gaseous products for DMMP decomposition
on both Cu100 and (CuO)80. Methanol and formaldehyde,
which evolve in the low temperature region, are believed to originate
from surface methoxy species. Methanol, formaldehyde, and methane
evolved in the high temperature region are related to further decomposition
of the phosphorus-containing surface species. A set of methanol-probed
TPD experiments have also been carried out, which suggest that methane
evolution originates from the methyl group within DMMP instead of
the surface methoxy species.