2013
DOI: 10.1039/c3nr00655g
|View full text |Cite
|
Sign up to set email alerts
|

Direct and accurate patterning of plasmonic nanostructures with ultrasmall gaps

Abstract: We report an improved method to directly and accurately fabricate plasmonic nanostructures with ultrasmall gaps. The fabrication is based on high-resolution focused ion beam milling with closely packed nanoring patterns. With fine and precise adjustment of the ion beam, elegant plasmonic nanostructures with ultrasmall dimensions down to 10 nm are achieved. We also show that the gap dimensions have a strong effect on the optical reflectance and transmittance of the plasmonic nanostructures. Measured results sho… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
23
0

Year Published

2013
2013
2023
2023

Publication Types

Select...
10

Relationship

4
6

Authors

Journals

citations
Cited by 35 publications
(26 citation statements)
references
References 42 publications
0
23
0
Order By: Relevance
“…33,34 In addition, the FIB/EB lithography method has a limitation of about 10 nm in the produced annular gap width for a thin metal film. 35 Creating a 10 nm-width gap in a thick metal film (more than 150 nm) is challenging for this method.…”
mentioning
confidence: 99%
“…33,34 In addition, the FIB/EB lithography method has a limitation of about 10 nm in the produced annular gap width for a thin metal film. 35 Creating a 10 nm-width gap in a thick metal film (more than 150 nm) is challenging for this method.…”
mentioning
confidence: 99%
“…Typically, two different processes are categorized: top-down and bottom-up fabrication techniques. The former includes focused ion beam (FIB) milling [59][60][61][62], electron-beam lithography (EBL) [63][64][65][66][67], nanoimprint [68][69][70][71], and interference lithography [72][73][74][75]. Various plasmonic designs have been demonstrated to enhance the sensing effect.…”
Section: Plasmonic Nanostructures For Enhanced Sensing Applicationsmentioning
confidence: 99%
“…Compared to other nanofabrication techniques, such as electron-beam lithography and reactive ion etching, FIB is much more competitive in fabricating nanostructures with high aspect ratios. We have successfully demonstrated the fabrication of dense nanostructure arrays using FIB in both dielectric and metallic materials [19][20][21][22]. However, high-aspect-ratio slanted nanostructures on flat substrates have not been studied using the FIB technique.…”
Section: Introductionmentioning
confidence: 99%