2016
DOI: 10.1039/c6ra13378a
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Direct electrochemical deposition of crystalline silicon nanowires at T ≥ 60 °C

Abstract: Direct synthesis of crystalline silicon (Si) nanowires at low temperatures has been achieved through an electrochemical liquid–liquid–solid (ec-LLS) process.

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Cited by 15 publications
(28 citation statements)
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“…Examples of a high degree of morphological control include the use of photolithographic patterning of Cu 2 O, 17 and electrodeposition of Si nanowires followed by generation of a catalyst layer. 18 In these cases, a general strategy for applying the synthesis methods to a variety of materials is lacking. A summary of recent methods for the preparation of H 2 WO 4 , BiVO 4 and TiO 2 , including synthesis time, advantages and disadvantages is shown in the Supporting Information Table S1.…”
Section: Introductionmentioning
confidence: 99%
“…Examples of a high degree of morphological control include the use of photolithographic patterning of Cu 2 O, 17 and electrodeposition of Si nanowires followed by generation of a catalyst layer. 18 In these cases, a general strategy for applying the synthesis methods to a variety of materials is lacking. A summary of recent methods for the preparation of H 2 WO 4 , BiVO 4 and TiO 2 , including synthesis time, advantages and disadvantages is shown in the Supporting Information Table S1.…”
Section: Introductionmentioning
confidence: 99%
“…They have focused on depositing semiconductor materials of nano size scale by using a novel approach employing a liquid cathode such as gallium or mercury. Successful deposition of silicon nanowires from propylene carbonate electrolyte with SiCl4 at temperatures as low as 60 o C by using liquid gallium droplets as cathode was reported (13). In this case silicon precipitates inside the liquid Ga cathode from a supersaturated solution and there is very little alloy formation.…”
Section: Introductionmentioning
confidence: 98%
“…Some promising results have been reported (9,10). Some interesting results have been published by Maldonado and co-workers (11)(12)(13). They have focused on depositing semiconductor materials of nano size scale by using a novel approach employing a liquid cathode such as gallium or mercury.…”
Section: Introductionmentioning
confidence: 99%
“… 22 Besides, there are reports of using photolithography to etch microhole arrays on silicon wafers and filling of Ga liquid metal nanodroplets as discrete ultra-microelectrodes to obtain Si nanowires by electrodeposition. 23 Currently, researchers have made relatively great progress in the preparation of crystalline silicon at low temperature. However, it is still necessary to further study the crystallization and growth mechanism of preparing silicon thin films to obtain high-quality crystalline silicon thin films for subsequent applications.…”
Section: Introductionmentioning
confidence: 99%