Direct Electrochemical Fabrication of Metallic Nanopillar Array on Au Electrode Surface by the Template Technique

Wang, Xiayan; Zhong, Hui; Yuan, Jinhua; Dong, Shengyi; Ma, Xiang; Xu, Jing‐Juan; Chen, Hong‐Yuan

doi:10.1246/cl.2004.982

Cited by 7 publications

(3 citation statements)

References 19 publications

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“…Gold nanorods and nanowires play a central role in a wide variety of molecular applications from energy conversion to biological sensing and gene delivery . Considerable interest has been drawn into controllably synthesizing Au nanowires and understanding their size dependence on mechanical, electrical, photonic, and optical properties. − Template-assisted electrodeposition into small pores is a technique commonly used to process Au nanowires and nanopillars on a large scale. − The structure of electrodeposited Au nanowires has been investigated using transmission electron microscopy (TEM) and X-ray diffraction. − TEM studies have revealed that 90% of Au nanowires fabricated by electrodeposition are fcc cylindrical crystals with [111] growth direction . In this letter, we use molecular dynamics simulation to describe a new type of size-dependent strengthening governed by interfacial plasticity in 〈111〉-oriented Au nanopillars consisting of growth twin boundaries.…”

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confidence: 99%

Strengthening in Gold Nanopillars with Nanoscale Twins

2007

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The role of growth twin boundaries on the slip activity of gold nanopillars under uniaxial compression was investigated by molecular dynamics simulation. A new type of size-dependent strengthening was found in twinned gold nanopillars. Strengthening resulted from slip arrests in the form of Lomer−Cottrell locks at the intersection of partial dislocations and twin boundaries. The significance of such phenomenon was found to depend on the twin size. These findings could help engineers design tunable mechanical properties in nanowires by interfacial plasticity.

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confidence: 99%

Strengthening in Gold Nanopillars with Nanoscale Twins

2007

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“…Nanosphere lithography (NSL) [9][10][11][12] is a promising nanofabrication technology that is inexpensive, high-throughput, materials general a Author to whom correspondence should be addressed. and has been demonstrated to be well suited to fabricate nanoholes, [13][14][15] metallic nanomesh electrodes, 16,17 or silicon, [18][19][20] noble metal, 21 cobalt, 22,23 and gallium nitride nanorod arrays. 24 The function of NSL relies on templates for nanostructure patterning.…”

Section: Introductionmentioning

confidence: 99%

Window-assisted nanosphere lithography for vacuum micro-nano-electronics

Pang

Yan

et al. 2015

AIP Advances

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Development of vacuum micro-nano-electronics is quite important for combining the advantages of vacuum tubes and solid-state devices but limited by the prevailing fabricating techniques which are expensive, time consuming and low-throughput. In this work, window-assisted nanosphere lithography (NSL) technique was proposed and enabled the low-cost and high-efficiency fabrication of nanostructures for vacuum micro-nano-electronic devices, thus allowing potential applications in many areas. As a demonstration, we fabricated high-density field emitter arrays which can be used as cold cathodes in vacuum micro-nano-electronic devices by using the window-assisted NSL technique. The details of the fabricating process have been investigated. This work provided a new and feasible idea for fabricating nanostructure arrays for vacuum micro-nano-electronic devices, which would spawn the development of vacuum micro-nano-electronics.

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“…By incrementing the etch time, the diameter of the nanospheres is steadily reduced, resulting in samples with metallic nanoparticles of increasing size until they eventually merge to form hole arrays. 63 66 The NSL produced nanowells can be used as deposition template to fabricate silicon, 65 67 68 noble metal, 69 cobalt, 56 57 and gallium nitride nanorod arrays. 70 On the other hand, with the application of NSL and RIE, our previous work has demonstrated the fabrication of ordered arrays of in-plane, triangular cross-section nanowells with in-plane widths ranging from 44 to 404 nm and depths ranging from 25 to 250 nm.…”

Section: Introductionmentioning

confidence: 99%

Advances in Contemporary Nanosphere Lithographic Techniques

Zhang

Whitney²,

Zhao³

et al. 2006

J. Nanosci. Nanotech.

124

130

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Nanosphere lithography (NSL) is an inexpensive, high throughput, materials general nanofabrication technique capable of producing a large variety of nanoscale structures including well-ordered 2 dimensional nanoparticle arrays. In this review, we will summarize the most recent advances in the fabrication of size-tunable nanoparticles using NSL. Four examples of new NSL-derived materials will be described: (1) The development of a method to release NSL nanoparticles from the substrate for applications in solution environments, (2) the fabrication of triangular nanoholes with reactive ion etching, (3) the electrochemical fine tuning of the structure of a silver nanoparticle and the wavelength of its localized surface plasmon resonance (LSPR), and (4) the growth of ultra thin protective dielectric layers on NSL-fabricated Ag nanotriangles using atomic layer deposition (ALD).

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Direct Electrochemical Fabrication of Metallic Nanopillar Array on Au Electrode Surface by the Template Technique

Cited by 7 publications

References 19 publications

Strengthening in Gold Nanopillars with Nanoscale Twins

Strengthening in Gold Nanopillars with Nanoscale Twins

Window-assisted nanosphere lithography for vacuum micro-nano-electronics

Advances in Contemporary Nanosphere Lithographic Techniques

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