2021
DOI: 10.1021/acsphotonics.1c00165
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Direct Growth of Hexagonal Boron Nitride on Photonic Chips for High-Throughput Characterization

Abstract: Adapting optical microscopy methods for nanoscale characterization of defects in two-dimensional (2D) materials is a vital step for photonic on-chip devices. To increase the analysis throughput, waveguidebased on-chip imaging platforms have been recently developed. Their inherent disadvantage, however, is the necessity to transfer the 2D material from the growth substrate to the imaging chip which introduces contamination, potentially altering the characterization results. Here we present a unique approach to … Show more

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Cited by 16 publications
(12 citation statements)
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“…It is inspired by mechanically exfoliated hBN layers used in a previous study [59]. The mechanical exfoliation of hBN is not scalable, and CVD growth of hBN requires exceedingly high temperatures (≈ 1000 °C) [54,55]. Therefore, we coated the second set of nominally identical samples with a protective dielectric layer using atomic layer deposition (ALD) [62][63][64][65][66][67] before the CVD process.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…It is inspired by mechanically exfoliated hBN layers used in a previous study [59]. The mechanical exfoliation of hBN is not scalable, and CVD growth of hBN requires exceedingly high temperatures (≈ 1000 °C) [54,55]. Therefore, we coated the second set of nominally identical samples with a protective dielectric layer using atomic layer deposition (ALD) [62][63][64][65][66][67] before the CVD process.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore this approach is assumed to be compatible with established CMOS processes for silicon nanostructures. Although the growth temperature for hBN is much higher compared to TMDs (≈ 1000 °C) [53,54], recent work demonstrated the direct growth of hBN on photonic chips [55]. However, hBN is a wide-gap dielectric, and electro-optical functionalization is thus difficult [56].…”
Section: Introductionmentioning
confidence: 99%
“…To transfer the 2D material from the growth substrate to the chip without contamination, Glushkov et al [82] grew a widely used 2D material (hexagonal boron nitride, hBN) on silicon nitride chips directly, and performed the optical characterization of defects in the intact as-grown material. In their investigation, the direct growth approach was compared with the standard wet transfer method to confirm the clear advantages of the direct growth.…”
Section: Two-dimensional Materialsmentioning
confidence: 99%
“…Integration of single photon emitters (SPEs) with photonic circuits is crucial, as it enables scalable components packaged on a single chip. In this regard, it is important not only to generate SPEs on a chip, but also to demonstrate routing of single photons, which is commonly achieved by photonic waveguides. For layered van der Waals (vdW) materials, the most common approach has been the hybrid one where the vdW host of the quantum emitters is positioned on top of a foreign cavity fabricated from a different material. As such, hBN emitters have been coupled to silicon nitride microdisks, waveguides and cavities However, the monolithic approach, whereby the photonic components and the emitters are fabricated from the same material, can provide substantial benefits such as higher coupling efficiencies and less stringent fabrication steps …”
mentioning
confidence: 99%