Direct imaging exposure equipment with high overlay accuracy for flexible substrate in roll‐to‐roll method

Abstract

In order to fabricate thin‐film transistors on a flexible substrate, it is required to overlay patterns with high alignment accuracy. A polymer film can be deformed greatly and easily through thin‐film transistor fabrication processes because the glass transition point of a polymer film is below the maximum temperature of the processes. Furthermore, low stiffness of a polymer film can cause deformation when the polymer film is loaded on a working holder. These matters make it difficult to make patterns directly on a polymer film with high alignment accuracy. We proposed three concepts that solve three technical issues in order to directly make patterns with high overlay accuracy on a flexible film without a support substrate. We developed roll‐to‐roll exposure equipment with high overlay accuracy for a flexible substrate. Using this equipment, we succeeded to directly make patterns on a PET film, achieving a resolution of less than 6‐μm line and space pattern and an overlay accuracy of less than ±5 μm.