2015
DOI: 10.1007/s12274-015-0849-0
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Direct low-temperature synthesis of graphene on various glasses by plasma-enhanced chemical vapor deposition for versatile, cost-effective electrodes

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Cited by 119 publications
(110 citation statements)
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“…Among these dielectric and insulating substrates, glass as transparent amorphous oxide is highly promise for G‐TCFs fabrication which can combine the intrinsic properties of graphene and glasses. The plasma‐enhanced CVD (PECVD) route can enable direct graphene coating on various glasses at a low temperature (400–600 °C) . The energetic plasma can dissociate CH 4 into various active species, such as CH x , C 2 H y , and atomic C and H, which are able to adsorb and collide onto the substrate surface, and play a dominant role in the graphene nucleation and growth ( Figure a).…”
Section: Graphenementioning
confidence: 99%
See 1 more Smart Citation
“…Among these dielectric and insulating substrates, glass as transparent amorphous oxide is highly promise for G‐TCFs fabrication which can combine the intrinsic properties of graphene and glasses. The plasma‐enhanced CVD (PECVD) route can enable direct graphene coating on various glasses at a low temperature (400–600 °C) . The energetic plasma can dissociate CH 4 into various active species, such as CH x , C 2 H y , and atomic C and H, which are able to adsorb and collide onto the substrate surface, and play a dominant role in the graphene nucleation and growth ( Figure a).…”
Section: Graphenementioning
confidence: 99%
“…a) Graphene growth on glass substrates by a direct PECVD route. Reproduced with permission . Copyright 2015, Springer.…”
Section: Graphenementioning
confidence: 99%
“…26 Several PECVD studies have been reported on SiO 2 , 27-38 quartz, 27,31,38 glass, 34,39 and Al 2 O 3 28,38 to explore the synthesis of graphene without metal catalysts at low temperature. Successful enlargement of isolated grain sizes has been realized using twostep growth in PECVD process.…”
Section: -24mentioning
confidence: 99%
“…[28][29][30] Other groups tried to grow continuous graphene using PECVD. However, these lms suffered from common problems such as many defects, less surface uniformity, [31][32][33][34][35][36][37][38][39] and three-dimensional (3D) nanowall growth. 31,34,37,40 All these drawbacks have limited graphene from fullling its excellent electrical properties and developing its advantage of atomic thickness.…”
Section: -24mentioning
confidence: 99%
“…19 Fused silica, as one of the most ordinary transparent insulating materials, has found plenty of applications in daily life. [28][29][30] Developing facile ways to directly grow uniform, large-area and high-quality monolayer MoS 2 on fused silica has significance in both basic research and low-cost device application.…”
Section: Introductionmentioning
confidence: 99%