UV and Higher Energy Photonics: From Materials to Applications 2021 2021
DOI: 10.1117/12.2596229
|View full text |Cite
|
Sign up to set email alerts
|

Direct patterning of TiO2 and TiN based sol-gel using laser interference and nanospheres UV lithography

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

2
2
0

Year Published

2022
2022
2023
2023

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(4 citation statements)
references
References 17 publications
2
2
0
Order By: Relevance
“…The thin film resulting from the nitration of a TiO2 sol-gel using RTN treatment, as seen in Figure 1, confirms the formation of a TiN layer through the presence of Raman bands characteristic of the TiN crystalline phase. This is consistent with previous studies [25][26][27][28][29][30][31][32][33][34][35][36][37] . The Raman spectrum of the TiO2 (Figure 1 in black) shows multiple peaks but no features of crystallized TiO2.…”
Section: Structural Propertiessupporting
confidence: 94%
See 2 more Smart Citations
“…The thin film resulting from the nitration of a TiO2 sol-gel using RTN treatment, as seen in Figure 1, confirms the formation of a TiN layer through the presence of Raman bands characteristic of the TiN crystalline phase. This is consistent with previous studies [25][26][27][28][29][30][31][32][33][34][35][36][37] . The Raman spectrum of the TiO2 (Figure 1 in black) shows multiple peaks but no features of crystallized TiO2.…”
Section: Structural Propertiessupporting
confidence: 94%
“…This can be attributed to residual porosity from the preparation method. However, as previously stated in our research [25][26][27][28][29][30][31][32][33][34][35][36][37] , these results indicate that the TiN layer, obtained through a simplified and cost-effective method, can still be potentially used as a plasmonic layer in the NIR range, despite some losses.…”
Section: Optical Propertiessupporting
confidence: 86%
See 1 more Smart Citation
“…Another option for producing ZrO2 thin films is the sol-gel method [26][27][28][29][30][31] . The sol-gel method allows the micro-nanostructuring of thin films through techniques such as optical 29,[31][32][33][34] and nanoimprint lithography [35][36][37] . Optical lithography has the advantage of being able to micro-nanostructure a wide range of substrates of different shapes 29,30,38 and sizes 39,40 without the need for etching processes.…”
Section: Introductionmentioning
confidence: 99%