Directed Self Assembly Materials for Hole Patterning

Polymer masks for structured surface and plasma etching

“…Using polymer blends, which are much more simple and affordable compounds, is consequently worth considering if both the size and the localization of the domains could be controlled. While the latter subject has already been addressed using directed self-assembly [38][39][40], there is still today the need to examine new polymer systems which are not based on the conventional PS/PMMA blend to expand the variety of phase behavior.…”

Eco-friendly step-and-flash imprint lithography using ultraviolet-curing liquid material with lactulose derivative derived from medicinal drugs for biomicrochips

“…Ultraviolet (UV) curing nanoimprint lithography using inkjet printing technology is expected as the key process for nextgeneration environmentally compatible nanofabrication and bio-nanoelectronic device manufacture. Such nanofabrication and device manufacture entail processes such as ArF immersion lithography using trilayer processes with a resist material, a hardmask, and etching transfer layers; [1][2][3][4][5] double patterning lithography; [6][7][8][9] extreme-ultraviolet (EUV) lithography; [10][11][12][13][14][15] electron beam (EB) lithography; [16][17][18][19] selfassembled lithography; 20,21) and UV curing nanoimprint lithography. [22][23][24][25][26] However, ArF immersion lithography, EUV lithography, and EB lithography, instead of the UV curing nanoimprint lithography are critical to reducing the overall cost of equipment.…”

Pattern Scaling of Holes, Bars, and Trenches with Directed Self-Assembly using Polymer Blend

“…Directed self-assembly (DSA) of block copolymers or polymer blends [1] has the potential to extend the resolution of immersion lithography and double patterning and even complement the future EUV lithography. The attractive properties of DSA, e.g.…”