Solid-state modulation of 2-dimensional electron gases (2DEGs) with extreme (~3.3x 10 14 cm -2 ) densities corresponding to 1/2 electron per interface unit cell at complex oxide heterointerfaces (such as SrTiO 3 /GdTiO 3 or SrTiO 3 /SmTiO 3 ) is challenging because it requires enormous gate capacitances. One way to achieve large gate capacitances is by geometrical capacitance enhancement in fin structures. In this work, we fabricate both Au-gated planar field effect transistors (FETs) and Fin-FETs with varying fin-widths on 60nm SrTiO 3 /5nm SmTiO 3 thin films grown by hybrid molecular beam epitaxy (hMBE). We find that the FinFETs exhibit higher gate capacitance compared to planar FETs. By scaling down the SrTiO 3 /SmTiO 3 fin widths, we demonstrate further gate capacitance enhancement, almost twice compared to the planar FETs. In the FinFETs with narrowest fin-widths, we demonstrate a record 2DEG electron concentration modulation of ~2.4 x 10 14 cm -2 .The recent discovery of extremely high electron density 2DEGs at the heterointerface of polar/nonpolar oxides such as LaAlO 3 /SrTiO 3 , GdTiO 3 /SrTiO 3 , SmTiO 3 /SrTiO 3 has opened up the area of oxide heterostructure electronics [1][2][3][4][5][6]. These 2DEG densities are of the order of ½ electron per unit cell corresponding to ~3.3 x 10 14 cm -2 , about one order higher than 2DEG densities found in traditional semiconductor heterostructures like III-Nitrides [3,7]. Because of the high electron density, these 2DEGs are interesting for realizing high power devices and tunable infrared plasmonic devices [7]. Apart from these traditional applications, large electron concentration modulation in transition metal oxides can also enable functionally different