Articles you may be interested inInternal residual stress studies and enhanced dielectric properties in La 0.7 Sr 0.3 CoO 3 buffered ( Ba , Sr ) TiO 3 thin films TiO 3 films with a thickness of 200 nm were deposited on Pt-Si substrates at 400 and 700°C. Room-temperature tunability was measured and found to improve with deposition temperature, but losses also increased. The dielectric constant, tunability, and loss tangent are found to be 350, 52%, and 0.07 at 300 kV/ cm for the 700°C deposition. The film grown at 700°C has a larger grain size, leading to approximately 5% higher tunability compared to the film deposited at 400°C. Supporting theoretical calculations were carried out using a modified Landau-Devonshire thermodynamic formalism that takes into account the internal stresses that arise from the differences of coefficients of thermal expansion between the film and the substrate.