Handbook of Semiconductor Technology 2000
DOI: 10.1002/9783527621842.ch6
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Dislocations

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Cited by 12 publications
(17 citation statements)
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“…These strain fields will affect the electrical and electronic properties of semiconductors by distorting the local bonding character. Charge transport and recombination may be altered through this effect on the electrostatic potential and via associated Cottrell atmospheres35. GPA is a method for obtaining local phase, which can be directly related to displacement field distorting the lattice fringes in the HRTEM or HAADF-STEM images with respect to the reference lattice36.…”
Section: Resultsmentioning
confidence: 99%
“…These strain fields will affect the electrical and electronic properties of semiconductors by distorting the local bonding character. Charge transport and recombination may be altered through this effect on the electrostatic potential and via associated Cottrell atmospheres35. GPA is a method for obtaining local phase, which can be directly related to displacement field distorting the lattice fringes in the HRTEM or HAADF-STEM images with respect to the reference lattice36.…”
Section: Resultsmentioning
confidence: 99%
“…In the particular case of dislocations in semiconductors the large body of work by H. Alexander and coworkers pointed out the complexity of the problem [13,14] that may relate to the interaction of dislocations with point defects [15], contributions from core energies [16], or the formation of point defects by moving dislocations [17][18][19]. As a result, quantitative TEM investigations of dislocations exhibit an unusual large data scatter [20] that is commonly of unknown origin.…”
Section: Introductionmentioning
confidence: 99%
“…Experimental data, however, obtained mainly by electron paramagnetic resonance (EPR) spectroscopy refer to a low density of such dangling bonds (Alexander & Teichler, 2000). Dislocations of the glide set reconstruct by dissociation (Heggie & Jones, 1983;Marklund, 1983;Alexander, 1991), while dislocations of the shuffle set, which may exist at high applied shear stress, can stabilized by interaction with vacancies (Li et al 2008).…”
Section: Structure Of Dislocations In Siliconmentioning
confidence: 99%
“…The electrical activity of dislocations in silicon and germanium was studied by numerous methods where mostly plastic deformation was applied to produce defined dislocation arrangements (for instance, Schröter & Cerva, 2002;Alexander & Teichler, 2000). Hall effect measurement was primarily applied to verify the electrical activity of dislocations and to propose first models (Gallagher, 1952;Read, 1954a, b;Schröter & Labusch, 1969).…”
Section: Electronic Properties Of Dislocations In Siliconmentioning
confidence: 99%
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