Dispersion Engineering of Silicon Nitride Microresonators via Reconstructable SU-8 Polymer Cladding

Wang, Shang-Pu; Lee, Tien-Hsiang; Chen, Youyuan; Wang, Pei-Hsun

doi:10.3390/mi13030454

Cited by 7 publications

(5 citation statements)

References 30 publications

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“…Next, we study the susceptibility of the waveguide Q factors with the polymer stripping process. In 17 , the one-time stripping process demonstrates no impact on the intrinsic Q, highlighting the reconstructability of dispersion engineering. Here, we further investigate the influence of a multi-cycle SU-8 stripping process on waveguide loss.…”

Section: Discussionmentioning

confidence: 94%

“…The slight increasement in the Q factor of the 100% cladded device can be attributed to the better light confinement similar to that of an oxide-cladded waveguide 23 . In contrast to the observed degradation of Q factors from 10 5 to 10 4 in the spin-coated device without polymer patterning, as mentioned in 17 , the demonstrated device is processed by lithographically patterning the polymer around the resonator area. Here, the intrinsic Q factor of the device with 100% coverage remains consistently greater than 10 5 .…”

Section: Discussionmentioning

confidence: 97%

“…In addition, for all the previous approaches, the dispersion is not reconstructable. With the polymer cladding, our previous work demonstrates the potential for dispersion reconstructability with patternable polymer cladding 17 . Here, we realize the dispersion tailoring in both normal and anomalous dispersion through conventional lithography patterning.…”

Section: Discussionmentioning

confidence: 99%

“…For waveguide resonators, the dispersion can be evaluated by the frequency differences between the adjacent free-spectral-range (FSR) of the cavity. The relation is expressed by the following equation 17 , 22 : where R is the radius of the resonator, c is the speed of light, m is the azimuthal mode number, λ is the optical wavelength, and characterizes the difference between the adjacent FSRs.…”

Section: Dispersion Engineering With Polymer Claddingsmentioning

confidence: 99%

“…For example, even with a comparable quality (Q) factor of lithium niobate (LN) waveguides after patterning oxide cladding 12 , HF wet etching may easily damage Si 3 N 4 15 or GaAs waveguides 16 . A recent work proposed the capability to flexibly adjust waveguide dispersion using SU-8 polymer as the cladding layer 17 . The patternable feature of the polymer cladding enables the waveguide dispersion to be engineered in a reconstructable manner.…”

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confidence: 99%

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Flexible dispersion engineering using polymer patterning in nanophotonic waveguides

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Hou

et al. 2023

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We demonstrate the engineering of waveguide dispersion by lithographically patterning the polymer cladding on silicon nitride waveguide resonators. Both normal and anomalous dispersion, ranging from − 462 to 409 ps/nm/km, can be achieved for the same waveguide dimension within an integrated photonic chip. In the meantime, this simple process shows no impact on the waveguide loss and the quality factor of the waveguide resonators, offering flexibility in tailoring designable dispersion for a universal photonic platform. In addition, by adjusting the coverage ratio of cladding, relatively low dispersion (≈ − 130 ps/nm/km) is also demonstrated in the same waveguide resonator, yielding the potentials for zero-dispersive waveguide resonators by a proper coverage ratio of the polymer cladding.

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Section: Discussionmentioning

confidence: 94%

Section: Discussionmentioning

confidence: 97%

Section: Discussionmentioning

confidence: 99%

Section: Dispersion Engineering With Polymer Claddingsmentioning

confidence: 99%

mentioning

confidence: 99%

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Flexible dispersion engineering using polymer patterning in nanophotonic waveguides

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et al. 2023

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Fabrication of gallium nitride waveguide resonators by high-power impulse magnetron sputtering at room temperature

Wu,

Chen,

Liu

et al. 2024

APL Photonics

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In this work, we demonstrate gallium nitride (GaN) waveguide resonators by sputtering amorphous GaN films on the silicon-based substrate. With the aid of high-power impulse magnetron sputtering (HiPIMS), high-quality, high-deposition-rate, and high-flatness GaN films can be deposited directly onto the silicon substrate with a 4 μm buried oxide layer at room temperature. Waveguide resonators with a quality factor of up to 4 × 104 are demonstrated, and closely critical coupling is achieved at a 0.2 μm gap by optimizing the gap sizes, showing a high extinction ratio of waveguide resonators at ≈24 dB. The fabrication process of HiPIMS-GaN waveguide resonators utilizes CMOS-compatible techniques and operates at a low thermal budget. Compared to conventional GaN films fabricated using metal-organic chemical vapor deposition, this study offers the potential to produce low-cost GaN waveguides on amorphous substrates and realize integrated GaN photonics in optical communication, nonlinear photonics, and quantum photonics by high-quality HiPIMS films.

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Low-dispersive silicon nitride waveguide resonators by nanoimprint lithography

Wang,

Zheng,

Liu

et al. 2024

APL Photonics

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In this study, we demonstrate the fabrication of waveguide resonators using nanoimprint technology. Without relying on traditionally costly lithography methods, such as electron-beam lithography or stepper lithography, silicon nitride (Si3N4) resonators with high-quality factors up to the order of 105 can be realized at C-band by nanoimprint lithography. In addition, by properly designing the waveguide geometry, a low-dispersive waveguide can be achieved with waveguide dispersion at around −35 ps/nm/km in the normal dispersion regime, and the waveguide dispersion can be further tuned to be 29 ps/nm/km in the anomalous dispersion regime with the polymer cladding. The tunability of nanoimprinted devices is demonstrated by the aid of microheaters, realizing on-chip optical functionalities. This work offers the potential to fabricate low-dispersive waveguide resonators for integrated modulators and filters in a significantly cost-effective and process-friendly scheme.

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Dispersion Engineering of Silicon Nitride Microresonators via Reconstructable SU-8 Polymer Cladding

Cited by 7 publications

References 30 publications

Flexible dispersion engineering using polymer patterning in nanophotonic waveguides

Flexible dispersion engineering using polymer patterning in nanophotonic waveguides

Fabrication of gallium nitride waveguide resonators by high-power impulse magnetron sputtering at room temperature

Low-dispersive silicon nitride waveguide resonators by nanoimprint lithography

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