In this work, we propose a novel way to flexibly engineer the waveguide dispersion by patterning the cladding of waveguide microresonators. Experimentally, we demonstrate silicon nitride waveguides with air-, oxide-, and SU-8 polymer-cladding layers and compare the corresponding waveguide dispersion. By integrating SU-8 polymer as the outer cladding layer, the waveguide dispersion can be tuned from −143 to −257 ps/nm/km. Through the simple, conventional polymer stripping process, we reconstruct the waveguide dispersion back to that of the original air-cladded device without significantly impacting the quality factor of resonators. This work provides the potential to design the waveguide dispersion in normal and anomalous regimes within an integrated photonic circuit.

We demonstrate the engineering of waveguide dispersion by lithographically patterning the polymer cladding on silicon nitride waveguide resonators. Both normal and anomalous dispersion, ranging from − 462 to 409 ps/nm/km, can be achieved for the same waveguide dimension within an integrated photonic chip. In the meantime, this simple process shows no impact on the waveguide loss and the quality factor of the waveguide resonators, offering flexibility in tailoring designable dispersion for a universal photonic platform. In addition, by adjusting the coverage ratio of cladding, relatively low dispersion (≈ − 130 ps/nm/km) is also demonstrated in the same waveguide resonator, yielding the potentials for zero-dispersive waveguide resonators by a proper coverage ratio of the polymer cladding.