1989
DOI: 10.1063/1.100949
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Displacement damage equivalent to dose in silicon devices

Abstract: Particle-induced displacement damage effects in silicon bipolar transistors, including those due to electrons and to fission neutrons, are correlated on the basis of the nonionizing energy deposited in the lattice by the primary knock-on atoms. Deviations from linearity between damage effects and energy deposition are in a direction opposite to those expected from defect cluster models but can be accounted for in terms of the fraction of vacancy-interstitial pairs initially formed that survive recombination.

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Cited by 29 publications
(12 citation statements)
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“…By extending the NIEL calculation to treat protons in InGaAs, we further develop the capability for predicting damage to these materials in space as reported in [15,16,17]. To justifjr our approach, we present the first experimental data to confirm the displacement damage proton energy dependence in the important category of III-V semiconductor materials.…”
Section: Introductionmentioning
confidence: 92%
See 1 more Smart Citation
“…By extending the NIEL calculation to treat protons in InGaAs, we further develop the capability for predicting damage to these materials in space as reported in [15,16,17]. To justifjr our approach, we present the first experimental data to confirm the displacement damage proton energy dependence in the important category of III-V semiconductor materials.…”
Section: Introductionmentioning
confidence: 92%
“…The general analom between NIEL for displacement damage and stopping power for ionization effects has been described [15,17], each being expressed as an energy loss rate (e.g. keVcm2/g).…”
Section: Prediction Of In Orbit Performancementioning
confidence: 99%
“…The resulting defects can be a point defect 14 or a large combination of points defects, called cluster of defects. 15 Similarly to TID, the amount of energy a particle deposit in silicon by displacing atoms can be quantified 16,17 by the displacement damage dose (DDD). 4 summarizes these radiation damages in MOS devices by showing that TID effects (trapped charges and interface states) are located in the IC oxides whereas displacement damages lead to bulk defects.…”
Section: Radiation Induced Damages In Mos Devicesmentioning
confidence: 99%
“…A reasonable method of assessing this is to make use of displacement damage dose. Displacement damage dose was first proposed by Dale, et al [16] and has been used extensively in areas such as photovoltaics [17]. It is completely analogous to the ionization dose and represents the damage energy per unit target mass.…”
Section: Nuclear Interactionsmentioning
confidence: 99%