1991
DOI: 10.1021/la00059a022
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Dissociation of hydrogen on metal surfaces

Abstract: Cluster calculations imply that the only stable state of H2 on simple and noble metals is fully dissociated. Calculations using a jellium substrate predict a stable state of molecular chemisorption. A plausible reason for the difference is proposed. By use of an energy diagram constructed on the basis of small cluster calculations, it is shown how molecules with very low kinetic energy can utilize vibrational energy to overcome a high entrance channel energy barrier to dissociation.

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Cited by 24 publications
(15 citation statements)
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“…This assumption of equality between adsorption and desorption energies should be valid here, since H 2 dissociation barriers on most transition metal surfaces are small or zero. 69 TDS experiments for high coverages of hydrogen on W(001) observed a desorption peak corresponding to 1.40 eV. 26 Our values are higher, but they reflect ¼ ML coverage where H-H repulsions are much smaller.…”
Section: Hydrogen On Tungsten Surfacesmentioning
confidence: 69%
“…This assumption of equality between adsorption and desorption energies should be valid here, since H 2 dissociation barriers on most transition metal surfaces are small or zero. 69 TDS experiments for high coverages of hydrogen on W(001) observed a desorption peak corresponding to 1.40 eV. 26 Our values are higher, but they reflect ¼ ML coverage where H-H repulsions are much smaller.…”
Section: Hydrogen On Tungsten Surfacesmentioning
confidence: 69%
“…At low coverage, Θ ads ≪, and with the activity of vacant sites close to unity, the surface coverage is approximated by, The equilibrium constant, K ads , contains parameters such as the sticking coefficient, s 0 , which is related to the catalytic activity of the metal surface. The catalytic activity of a metal surface has direct implications on the dynamics of the H 2 -metal interaction, and has been attributed to geometric factors such as crystallographic orientation and surface inhomogeneities, as well as to electronic factors such as defect induced potentials, work functions and the density of states at the Fermi level [92][93][94][95][96].…”
Section: Mass Transfer: Adsorption Dissociation and Diffusionmentioning
confidence: 99%
“…14 This will increase the Pauli repulsion between the surface s electrons and the approaching close-shelled H 2 , which should pile up the reaction barrier at the entrance channel. 31 These experimental and theoretical works explain the H and H desorption behaviors in the present work. Previous work indicated that H species arise from the decomposition of surface hydroxyls on hardly reducible iron oxides.…”
Section: H 2 -Tprmentioning
confidence: 54%