Dissociative electron attachment and dissociative ionization of 1,1-dichloro-1-silacyclohexane and silacyclohexane

Bjarnason, Elías H.; Ómarsson, Benedikt; Jonsdottir, Nanna R.; Arnason, Ingvar; Ingólfsson, Oddur

doi:10.1016/j.ijms.2014.06.020

Cited by 8 publications

(11 citation statements)

References 35 publications

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“…From the DEA study of DCSCH ( Fig. 2 and [ 35 ]), one can see that DEA is mainly active below 2 eV, and in the range of 6–9 eV, with the integral cross section being similar for both these energy ranges. This means that the inert behaviour of SCH towards DEA, as compared to DCSCH, only concerns electrons of energies below 2 eV and in the range of 6–9 eV.…”

Section: Resultsmentioning

confidence: 99%

“… Molecular structure of (a) 1,1-dichloro-1-silacyclohexane (cyclo-C 5 H 10 SiCl 2 ) and (b) silacyclohexane (cyclo-C 5 H 10 SiH 2 ). Adapted from [ 35 ]. …”

Section: Introductionmentioning

confidence: 99%

“…In a fairly recent gas phase study [ 35 ], where these molecules were exposed to low-energy electrons under single-collision conditions, it was shown that while appreciable decomposition of DCSCH was affected through DEA, SCH was inert with regards to this process. Dissociative ionisation, on the other hand, leads to similar fragmentation of both these molecules.…”

Section: Introductionmentioning

confidence: 99%

“… Negative ion yield curve for the principal fragments formed by the electron attachment dissociation of DCSCH in the energy range from 0–14 eV. Adapted from [ 35 ]. …”

Section: Introductionmentioning

confidence: 99%

“… Positive ion mass spectra of (a) DCSCH and (b) SCH, both spectra are recorded at an electron impact energy of 70 eV. Adapted from [ 35 ]. …”

Section: Introductionmentioning

confidence: 99%

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Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

P¹,

Hari²,

Damodaran³

et al. 2017

Beilstein J. Nanotechnol.

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We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds and we compare the proximity effect observed for these compounds. The two precursors show similar behaviour with regards to fragmentation through dissociative ionization in the gas phase under single-collision conditions. However, while DCSCH shows appreciable cross sections with regards to dissociative electron attachment, SCH is inert with respect to this process. We discuss our deposition experiments in context of the efficiency of these different electron-induced fragmentation processes. With regards to the deposition dynamics, we observe a substantially faster growth from DCSCH and a higher saturation diameter when growing pillars with high aspect ratio. However, both compounds show similar behaviour with regards to the proximity effect. With regards to the composition of the deposits, we observe that the C/Si ratio is similar for both compounds and in both cases close to the initial molecular stoichiometry. The oxygen content in the DCSCH deposits is about double that of the SCH deposits. Only marginal chlorine is observed in the deposits of from DCSCH. We discuss these observations in context of potential approaches for Si deposition.

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Section: Resultsmentioning

confidence: 99%

“… Molecular structure of (a) 1,1-dichloro-1-silacyclohexane (cyclo-C 5 H 10 SiCl 2 ) and (b) silacyclohexane (cyclo-C 5 H 10 SiH 2 ). Adapted from [ 35 ]. …”

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

“… Negative ion yield curve for the principal fragments formed by the electron attachment dissociation of DCSCH in the energy range from 0–14 eV. Adapted from [ 35 ]. …”

Section: Introductionmentioning

confidence: 99%

“… Positive ion mass spectra of (a) DCSCH and (b) SCH, both spectra are recorded at an electron impact energy of 70 eV. Adapted from [ 35 ]. …”

Section: Introductionmentioning

confidence: 99%

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