2005
DOI: 10.4028/www.scientific.net/ssp.103-104.283
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Dissolution Characteristics of Ceria in Ascorbic Acid Solutions with Implications to Cleaning

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Cited by 9 publications
(6 citation statements)
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“…Tamilmani et al (2005) measured the reductive dissolution of 300-nm particles of CeO 2 in an ascorbic acid solution over a range of pH. The concentration of dissolved Ce was determined through ICPMS analysis.…”
Section: Resultsmentioning
confidence: 99%
“…Tamilmani et al (2005) measured the reductive dissolution of 300-nm particles of CeO 2 in an ascorbic acid solution over a range of pH. The concentration of dissolved Ce was determined through ICPMS analysis.…”
Section: Resultsmentioning
confidence: 99%
“…So far, dissolution rates of CeO 2 thin films have been measured for various acidic [32] (i.e., HCl and H 2 SO 4 ) and oxidizing (addition of H 2 O 2 ) [32] media, despite common views that CeO 2 is a highly insoluble refractory oxide. [33] Furthermore, uptake and biotransformation of CeO 2 NPs in a recent cucumber-plant system led to Ce phosphate rods in intercellular spaces. [34] We also show formation of rod-shaped crystallites in the liver near in vivo processed CeO 2 NPs; they are composed of Ce, O, and P as shown in TEM and corresponding energy-dispersive X-ray spectroscopy (EDS) analyses (Figure 1e; Figure S5) and are of comparable size and morphology as sol-gel-derived Ce phosphates.…”
Section: In Vivo Processing Mechanisms Of Nanoceriamentioning
confidence: 99%
“…52 However, some dissolution may be expected in the presence of reducing agents such as ascorbic acid especially at low pH values and in the presence of catalytic materials, as these can reducibly dissolve ceria generating free Ce 3+ . [53][54][55] This process is commonly used in chemical mechanical polishing (CMP) in microelectronics applications for post CMP cleaning of ceria containing slurries. Changes in the oxidation state and pH can change solubility status.…”
Section: Physicochemical Changes Of Nanoceria In Environmental Exposu...mentioning
confidence: 99%