Dissolution of copper thin films in hydroxylamine-based solutions

Huang, Wayne; Tamilmani, Subramanian; Raghavan, Srini; Small, Robert J.

doi:10.1016/s0301-7516(03)00111-x

Cited by 19 publications

(6 citation statements)

References 3 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

Section: Resultssupporting

confidence: 90%

“…Further increase in pH to 8 (OCP52215 mV v. SCE) reduces the dissolution rate of copper to 0?5 nm min 21 . The dissolution rate and the trend are in agreement with the report of Huang et al5 who determined dissolution rates from the analysis of solutions for copper.At an anodic overpotential of 250 mV, the dissolution rate of copper at pH 4 increases dramatically to y60 nm min 21 . Interestingly, this level of overpotential increases the dissolution rates at pH 6 and 8 only slightly, to y14 and 0?7 nm min 21 respectively.…”

supporting

confidence: 91%

“…The passive film must have excellent chemical stability but poor mechanical stability so that it can be removed easily by the application of a very small downforce. 4 Benzotriazole (BTA, C 6 H 5 N 3 ), a commonly used copper corrosion inhibitor, 5 is often used in ECMP formulations.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Anodic dissolution of copper in dilute hydroxylamine solutions: application to electrochemical mechanical planarisation of copper

Muthukumaran

Venkataraman

Tamilmani

et al. 2009

Corrosion Engineering, Science and Technology

View full text Add to dashboard Cite

The effect of anodic polarisation on dissolution of copper in hydroxylamine based chemical systems has been studied using a quartz crystal microbalance technique to evaluate their use in electrochemical mechanical planarisation processes. Copper dissolution in hydroxylamine solution increases with respect to overpotential g and dissolution rates as high as 600 nm min 21 have been obtained at an overpotential of 750 mV. The effectiveness of benzotriazole (BTA) in inhibiting copper dissolution in these chemistries was also tested. It was found that BTA is effective in inhibiting copper dissolution only at lower overpotentials ((250 mV).

show abstract

Section: Resultssupporting

confidence: 90%

supporting

confidence: 91%

See 1 more Smart Citation

Anodic dissolution of copper in dilute hydroxylamine solutions: application to electrochemical mechanical planarisation of copper

Muthukumaran

Venkataraman

Tamilmani

et al. 2009

Corrosion Engineering, Science and Technology

View full text Add to dashboard Cite

show abstract

“…When the pH was 4.2 and 7.0, about 44% and 32% of the monomers remained after the reactions. It is known that the reductive activity of hydroxylamine increases with elevated pH value . Our experimental results showed that the stoichiometric reaction ratio of NH 2 OH to HAuCl 4 decreased from 2.7 to 1.2 when the pH increased from 4.2 to 11.0 (see Figure S1 in the Supporting Information).…”

Section: Resultsmentioning

confidence: 60%

“…It is known that the reductive activity of hydroxylamine increases with elevated pH value. 39 Our experimental results showed that the stoichiometric reaction ratio of NH 2 OH to HAuCl 4 decreased from 2.7 to 1.2 when the pH increased from 4.2 to 11.0 (see Figure S1 in the Supporting Information). It is plausible that the increased branch length of the nanoflowers was related to the faster consumption of the gold ions under higher pH.…”

Section: Resultsmentioning

confidence: 75%

Formation and Stability of Gold Nanoflowers by the Seeding Approach: The Effect of Intraparticle Ripening

et al. 2009

View full text Add to dashboard Cite

The seeding approach for preparation of gold nanoflowers in which 25 nm gold nanoparticles were used as the seeds and a mixture of HAuCl4 and hydroxylamine as growth solution was investigated systematically. It is revealed that the formation and stability of the nanoflowers were affected greatly by the intraparticle ripening induced by the chlorine ions that existed in the reaction system. In this seeding approach, hydroxylamine promoted the rapid reduction of HAuCl4 and thus rapid formation of small Au particles with a diameter around 3 nm in the growth solution. The attachment of the small particles on the seed surface contributed to the growth of the nanoflowers. The branch length of the nanoflowers increased with the increased pH of the growth solution due to the suppressed ripening at higher pH. The stability of the nanoflowers can be improved by increasing the pH of the storing solution and/or removal of the chlorine ions.

show abstract

A review: research progress of chemical–mechanical polishing slurry for copper interconnection of integrated circuits

Yan

Niu

et al. 2023

Int J Adv Manuf Technol

View full text Add to dashboard Cite

Dissolution of copper thin films in hydroxylamine-based solutions

Cited by 19 publications

References 3 publications

Anodic dissolution of copper in dilute hydroxylamine solutions: application to electrochemical mechanical planarisation of copper

Anodic dissolution of copper in dilute hydroxylamine solutions: application to electrochemical mechanical planarisation of copper

Formation and Stability of Gold Nanoflowers by the Seeding Approach: The Effect of Intraparticle Ripening

A review: research progress of chemical–mechanical polishing slurry for copper interconnection of integrated circuits

Contact Info

Product

Resources

About