2016
DOI: 10.1021/acsnano.6b00413
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DNA Origami Mask for Sub-Ten-Nanometer Lithography

Abstract: DNA nanotechnology is currently widely explored and especially shows promises for advanced lithography due to its ability to define nanometer scale features. We demonstrate a 9 × 14 nm(2) hole pattern transfer from DNA origami into an SiO2 layer with a sub-10-nm resolution using anhydrous HF vapor in a semiconductor etching machine. We show that the resulting SiO2 pattern inherits its shape from the DNA structure within a process time ranging from 30 to 60 s at an etching rate of 0.2 nm/s. At 600 s of etching,… Show more

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Cited by 53 publications
(58 citation statements)
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“…While much work is still needed to approach commercial viability, lithographically confined DNA origami and large crystalline arrays of DNA origami show potential as self-assembled lithographic masks 12 and templates for precise nanoparticle assemblies.…”
Section: -10mentioning
confidence: 99%
“…While much work is still needed to approach commercial viability, lithographically confined DNA origami and large crystalline arrays of DNA origami show potential as self-assembled lithographic masks 12 and templates for precise nanoparticle assemblies.…”
Section: -10mentioning
confidence: 99%
“…Moreover, with the fact that DNA origami provides site‐specific docking sites for many nanomaterials, the spatially ordered DNA origami can be further utilized to create hierarchical order and complex patterns, such as large array of gold nanoparticles and fluorescence image of van Gogh's The Starry Night (Figure M). Similarly, DNA origami structures were used as masks for the construction of nanoscale pattern . This technique allows the transfer of spatial information of DNA origami, such as size and shape, into 2D nanomaterials pattern (Figure N).…”
Section: Fabrication Of Nanoscale Patterns On Dna Origamimentioning
confidence: 99%
“…C) AFM image of a nanoscale post produced by DNA‐mediated etching of SiO 2 . Reproduced with permission . Copyright 2016, American Chemical Society.…”
Section: Dna‐based Nanofabricationmentioning
confidence: 99%
“…For plasma‐based etching processes, a metal coating is often needed to improve the chemical stability of the DNA template itself (Figure A) . In contrast, HF‐vapor etching was reported to be compatible with unmodified DNA nanostructures, producing both positive‐ and negative‐tone patterns with resolutions down to sub‐10 nm scale (Figure C) …”
Section: Dna‐based Nanofabricationmentioning
confidence: 99%