1999
DOI: 10.1063/1.124953
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Double-chirped semiconductor mirror for dispersion compensation in femtosecond lasers

Abstract: A double-chirped mirror structure with broadband negative dispersion was realized with semiconductor technology. The necessary high precision of the fabrication was achieved by using special calibration structures. A single reflection on the obtained low-loss mirror produces sufficient negative dispersion for dispersion compensation in a femtosecond laser cavity. In this way we demonstrate 200 fs pulses from a compact Nd:glass laser without any additional dispersion compensation.

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Cited by 21 publications
(5 citation statements)
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“…For example, we have demonstrated with many examples that non-quarterwave layers in mirrors give more design freedom for integrating the absorber layers into the mirror structure. Furthermore, saturable absorbers combined with negative dispersion compensation can be obtained with GTI-type (Gires-Tournois Interferometer) SESAMs [28] or double-chirped semiconductor mirror structures that can provide very broadband negative dispersion [30]. In addition, low field enhancement (LFR) SESAM designs [31, ?…”
Section: S E S a MD E S I G N Smentioning
confidence: 99%
“…For example, we have demonstrated with many examples that non-quarterwave layers in mirrors give more design freedom for integrating the absorber layers into the mirror structure. Furthermore, saturable absorbers combined with negative dispersion compensation can be obtained with GTI-type (Gires-Tournois Interferometer) SESAMs [28] or double-chirped semiconductor mirror structures that can provide very broadband negative dispersion [30]. In addition, low field enhancement (LFR) SESAM designs [31, ?…”
Section: S E S a MD E S I G N Smentioning
confidence: 99%
“…Subsequent incorporation of QW layers in a monolithic Fabry-Perot structure consisting of high reflectivity and low loss GaAs/AlAs Bragg stack, GaAs spacer, and appropriately designed top coating allowed adjusting the field strength at the location of the QW layers as well as on the input optical surface [18,[28][29][30][31]. This obviated the need for extended coupled cavities, thus making the device more robust, and also gave additional means for controlling intracavity dispersion and optical damage threshold [18,[32][33][34][35][36][37]. Possibilities of semiconductor material and structure engineering are very rich, indeed, while the molecular beam epitaxy (MBE) and metal-organic chemical vapor deposition (MOCVD) growth processes allow for excellent control of growth process with a submonolayer precision.…”
Section: Quantum-well Saturable Absorbers: Overviewmentioning
confidence: 99%
“…The growth rate was determined roughly with reflection high energy electron diffraction (RHEED) oscillations and precisely by high resolution x-ray diffraction performed on a number of test structures. As the growth accuracy determines the smoothness of the group delay spectral characteristic [14] and the growth rate is not constant for different layer thicknesses, it was separately determined for thick (above 30 nm), medium (10-30 nm), and thin (5-10 nm) layers. Above 30 nm the growth rate was measured to be ∼1.0 µm h −1 whereas for a five times thinner AlAs layer it was higher by ∼10%.…”
Section: Sdcm Design and Fabricationmentioning
confidence: 99%
“…Semiconductor structures may also be used as optical dispersive elements inside the laser cavity, replacing prisms or recently developed dielectric mirrors in femtosecond oscillators [10][11][12][13]. Low refractive index contrast of semiconductor materials results in a higher number of mirror stack layers necessary to reach high reflectivity [14,15]. On the other hand, more layers in the mirror structure result in a larger difference in effective propagation depths for different wavelengths and thus higher dispersion per bounce can be achieved.…”
Section: Introductionmentioning
confidence: 99%