“…For example, the application of an EBL composed of three thin p-type AlxGa1−xN layers with step-graded values of x = 0.04, 0.08, and 0.12 was found to limit the observed droop in the EQE to just 29% less than its initial value, while the application of a 50 nm thick p-type Al0.16Ga0.84N EBL exhibited a corresponding decrease of 44% [11]. In addition, the application of double-sided, step-graded AlxGa1−xN EBL, with x being 5%, 10%, and 15% and a step width of 4 nm along each growth direction (from the last QW to p-AlGaN), improves internal quantum efficiency (IQE), optical output power, and nearly eliminating the droop in the IQE [12]. While these past studies have demonstrated the beneficial impact of step-graded AlxGa1−xN EBLs on the IQE droop of GaN-based LEDs, absolute enhancements in the IQE and optical output power of the devices remain limited because hole injection is affected by the downward band-bending induced by the serious polarization at the interface between the EBL and the last QB of the LED [13,14].…”