“…During the last two decades, direct laser writing emerged as versatile tool in nano- and micro-fabrication of integrated photonic circuits, Bragg gratings, optical memory bits, microfluidic and optofluidic channels, phase and polarizing elements and devices in bulk dielectrics [ 1 , 2 , 3 , 4 , 5 ]. Inscription in a homogeneous dielectric medium requires a formation of a new high-contrast refractive-index interface, possible via densification in silica materials [ 6 , 7 ] and rarefaction in other dielectrics [ 8 ], boosting empty nanovoids [ 9 ] or drilling of hollow microchannels [ 10 ]. Meanwhile, rather recently—about one decade ago—a new fundamental high-NA (numerical aperture) laser inscription process (“bulk nanopatterning”, BN), relying on nanoplasmonic self-organization of birefringent grating arrays in bulk dielectrics as functional microbits, was matured for design and fabrication of innovative optical elements and devices.…”