Drug powders with tunable wettability by atomic and molecular layer deposition: From highly hydrophilic to superhydrophobic

Zara, Damiano La; Zhang, Fuweng; Sun, Feilong; Bailey, Maximilian R.; Quayle, Michael J.; Petersson, Gunilla; Folestad, Staffan; Ommen, J. Ruud van

doi:10.1016/j.apmt.2021.100945

Cited by 24 publications

(20 citation statements)

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“…Instead, TiO 2 loadings of 3.8, 10.7, and 21.1 wt %, equivalent to budesonide loadings of 96.2, 89.3, and 78.9 wt %, were found after 10, 25, and 50 cycles, respectively (see Figure f). The significantly lower loadings of SiO 2 than TiO 2 for comparable thickness are due to the lower density of SiO 2 , which is estimated to be 1.6 g/cm 3 , whereas the density of TiO 2 after ALD at ∼40 °C is reported to be 3.3 g/cm 3 . The higher density of TiO 2 is also evidenced by the darker films under TEM.…”

Section: Resultsmentioning

confidence: 96%

“…Atomic layer deposition (ALD) is a vapor-phase technique for depositing ultrathin conformal films on any substrate with thickness control at the sub-nanometer level. , Alternating exposures of a precursor and a co-reactant in the vapor phase separated by purging steps enable self-terminating reactions with the substrate surface, thus resulting in an atomically controlled film growth. Widely used for the functionalization of wafers in the semiconductor industry with oxide ceramic films, ALD has also been applied to a large variety of powders, recently also including pharmaceutical particles, due to its ability to conformally coat complex three-dimensional substrates. − Crucially, nanophase ceramics have already been used in a broad spectrum of biomedical and drug delivery applications, as they can modulate drug release kinetics, incorporate multifunctional molecules, and target action sites . ALD of oxide ceramics can therefore extend release and improve flow properties and solid-state stability of virtually any pharmaceutical substance. − , Nanoscale oxide ceramic ALD films have been shown to slow down the dissolution rate of acetaminophen particles, while preventing drug chemical degradation and cytotoxicity .…”

Section: Introductionmentioning

confidence: 99%

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Controlled Pulmonary Delivery of Carrier-Free Budesonide Dry Powder by Atomic Layer Deposition

et al. 2021

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Ideal controlled pulmonary drug delivery systems provide sustained release by retarding lung clearance mechanisms and efficient lung deposition to maintain therapeutic concentrations over prolonged time. Here, we use atomic layer deposition (ALD) to simultaneously tailor the release and aerosolization properties of inhaled drug particles without the need for lactose carrier. In particular, we deposit uniform nanoscale oxide ceramic films, such as Al2O3, TiO2, and SiO2, on micronized budesonide particles, a common active pharmaceutical ingredient for the treatment of respiratory diseases. In vitro dissolution and ex vivo isolated perfused rat lung tests demonstrate dramatically slowed release with increasing nanofilm thickness, regardless of the nature of the material. Ex situ transmission electron microscopy at various stages during dissolution unravels mostly intact nanofilms, suggesting that the release mechanism mainly involves the transport of dissolution media through the ALD films. Furthermore, in vitro aerosolization testing by fast screening impactor shows a ∼2-fold increase in fine particle fraction (FPF) for each ALD-coated budesonide formulation after 10 ALD process cycles, also applying very low patient inspiratory pressures. The higher FPFs after the ALD process are attributed to the reduction in the interparticle force arising from the ceramic surfaces, as evidenced by atomic force microscopy measurements. Finally, cell viability, cytokine release, and tissue morphology analyses verify a safe and efficacious use of ALD-coated budesonide particles at the cellular level. Therefore, surface nanoengineering by ALD is highly promising in providing the next generation of inhaled formulations with tailored characteristics of drug release and lung deposition, thereby enhancing controlled pulmonary delivery opportunities.

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Section: Resultsmentioning

confidence: 96%

Section: Introductionmentioning

confidence: 99%

Controlled Pulmonary Delivery of Carrier-Free Budesonide Dry Powder by Atomic Layer Deposition

et al. 2021

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“…Another zinc precursor employed in ALD/MLD is zinc acetate. [117,229] For titanium, the most common precursor is TiCl 4 , extensively used with EG, [179,293,[391][392][393][394][395][396][397][398][399][400] and other orga nics. [46,49,105,112,122,211,230,232,235,248,254,255,336,378,390,[401][402][403][404][405][406][407][408] For example, the combination, TiCl 4 plus maleic anhydride has been utilized to deposit thin films with biologic synaptic functions.…”

Section: Aluminum- Zinc- and Titanium-based Processesmentioning

confidence: 99%

“…New organic components have also been developed for the purely organic MLD processes; the MLD material library already includes, besides the initially introduced polyimides [ 15,17–22,137–143 ] and polyamides, [ 15,23–28,144–149 ] many other polymers: polyurea, [ 29,30,37,38,51,150–164 ] polythiourea, [ 52 ] polyurethane, [ 165,166 ] polyazomethine, [ 167–172 ] poly(3,4‐ethylenedioxy‐thiophene), [ 173–177 ] polyimide–polyamide, [ 141 ] poly(ethylene terephthalate) (PET), [ 50,178–180 ] and others. [ 31,32,39–44,176,181–200 ] In recent years, the organic precursor library has been rapidly expanding.…”

Section: Organic Precursors In Ald/mldmentioning

confidence: 99%

“…For titanium, the most common precursor is TiCl 4 , extensively used with EG, [ 179,293,391–400 ] and other organics. [ 46,49,105,112,122,211,230,232,235,248,254,255,336,378,390,401–408 ] For example, the combination, TiCl 4 plus maleic anhydride has been utilized to deposit thin films with biologic synaptic functions.…”

Section: Brief Account Of Ald/mld Processes Developedmentioning

confidence: 99%

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Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multia

Karppinen

2022

Adv Materials Inter

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organic ligands act as bridges between the metal centers to form infinite 1D, 2D, or 3D structures. These materials are often referred to as coordination polymer (CP) [1] or metal-organic framework (MOF) [2] materials; the latter term is used when the metal-organic material is crystalline and highly porous. [3] The research field of CP-and MOF-type materials has grown tremendously over the last two decades. The structural and chemical diversity of these materials has served as a continuous source of scientific excitement; the same diversity has also triggered huge technological interest as these materials possess enormous potential to be tailored for a wide variety of applications ranging from gas capture, storage, and separation to sensing, catalysis, optics, electronics, and energy storage. [4][5][6][7] Most of the targeted application breakthroughs of metal-organics require that these materials can be produced as highquality thin films and coatings, which can be integrated with the other components in the actual device configuration. The possibility to deposit such thin films in an industry-feasible manner on the substrate types needed, would be a major step forward in the field. [8] Traditionally, solvent-based processes such as liquid-phase epitaxy, Langmuir-Blodgett, layer-by-layer, and electrochemical deposition techniques have been used for metal-organic thin films. [9][10][11] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high-aspect-ratio features. Hence, it is vital to develop solventfree thin-film deposition routes for the metal-organic material family. In the optimal case, these deposition methods should allow conformal coatings on large-area and high-aspect-ratio substrates.The currently strongly emerging ALD/MLD technique is uniquely suited to address the challenge in a scientifically elegant yet industrially feasible way. This technique is derived from the two parent gas-phase thin-film techniques: ALD for inorganic materials (mostly binary metal oxides, sulfides, and nitrides), [12][13][14] and its counterpart MLD for purely organic thin films (e.g., polyimides and polyamides). [15] In both cases, the attractive film growth characteristics are derived from the unique way of separating the different precursor gas pulses. Currently, ALD is the standard thin-film technology in many Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal-organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali...

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Perspectives on the Wetting of Solids in Pharmaceutical Systems

Newman¹,

Zografi

2023

Pharm Res

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Drug powders with tunable wettability by atomic and molecular layer deposition: From highly hydrophilic to superhydrophobic

Cited by 24 publications

References 92 publications

Controlled Pulmonary Delivery of Carrier-Free Budesonide Dry Powder by Atomic Layer Deposition

Controlled Pulmonary Delivery of Carrier-Free Budesonide Dry Powder by Atomic Layer Deposition

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Perspectives on the Wetting of Solids in Pharmaceutical Systems

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