DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI

Hillmann, Frank; Döbereiner, S.; Gittinger, Christian; Reiter, R.A.; Falk, Günther; Bruck, H; Scheuring, Gerd; Bosser, Artur; Heiden, Michael; Hoppen, Gerhard; Sulik, Wolfgang; Vollrath, Wolfgang

doi:10.1117/12.637295

Cited by 2 publications

(1 citation statement)

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“…Two UV (Leica LWM250 UV, MueTec 2010 NT) and two DUV transmission microscopy CD tools (Leica LWM270 DUV, MueTec <M5k>) and two CD-SEM tools (HOLON EMU 220A) were used by the participants. In addition to this, first -however not yet calibrated -measurements by means of a new water immersion DUV tool with NA of 1.2 were performed (LWM 500 WI) [2]. The measurements were supported by characterizations of CD and edge profile and slope by AFM (Park Scientific Autoprobe M5, Veritekt).…”

Section: Instrumentation and Signal Modelling Approachesmentioning

confidence: 99%

Calibration procedures and application of the PTB photomask CD standard

et al. 2005

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The PTB has developed a new 6025 photomask standard for calibration of CD metrology tools in a joint project with partners from mask industry in Germany [1]. We report on the design of the standard, its calibration procedures and the results of recent round robin measurements on this standard in which different CD metrology tools of the project partners were involved.The layout of the CD photomask standard (COG and 193 nm halftone PSM) contains isolated as well as dense features in both tones with nominal CD down to 100 nm. Calibration of the standards was performed at PTB by UV microscopy and LV-SEM, supported by additional AFM measurements for edge slope characterization. For analysis of UV microscopy as well as SEM images appropriate signal modeling was applied, which allowed to extract the feature widths at the top of the structures as well as the widths at 50% height of the structures.In this contribution we will also discuss results of a recent round robin comparison measurement performed on up-todate metrology tools available for CD metrology today by means of one of the newly developed CD standards. We used PTB calibrated CD standards in order to provide a set of CD references for the different tools which then should be used in a "blind" comparison to calibrate an unknown CD mask of the same design as the standards. Different type of CD metrology instrumentation, namely standard UV and DUV optical as well as DUV water immersion CD microscopes, a new UV dark field optical microscope, CD-SEM, and AFM/SFM were applied. The outcome of this comparison on currently applied metrology instrumentation provides a valuable source of information for cross calibration issues which are discussed in mask industry today.

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Section: Instrumentation and Signal Modelling Approachesmentioning

confidence: 99%