Dynamic effects in siloxane PECVD coatings

Zuber, Kamil; Radjef, Racim; Hall, Colin

doi:10.1016/b978-0-08-102572-7.00006-4

Cited by 2 publications

(2 citation statements)

References 53 publications

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“…Thermally activated chemical vapor deposition processes cannot be used for PC treatment because of deposition temperature limitations, so only plasma‐enhanced chemical vapor deposition (PECVD) processes are applicable to form hard inorganic coatings on PC, and they have been successfully used for the formation of abrasion and scratch‐resistant coatings. [ 6,8,9 ]…”

Section: Introductionmentioning

confidence: 99%

“…Thermally activated chemical vapor deposition processes cannot be used for PC treatment because of deposition temperature limitations, so only plasmaenhanced chemical vapor deposition (PECVD) processes are applicable to form hard inorganic coatings on PC, and they have been successfully used for the formation of abrasion and scratch-resistant coatings. [6,8,9] Low-temperature plasma-enhanced CVD processes are of particular interest because they allow the formation of organic-inorganic coatings due to their essence. For example, silicon dioxide films deposited by PECVD always contain fragments of incompletely reacted precursor playing the role of an organic component.…”

Section: Introductionmentioning

confidence: 99%

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A study of the microhardness and scratch and abrasion resistance of silica‐like coatings deposited from TEOS and HMDSO on polycarbonate by AP PECVD

Bil,

Alexandrov,

Breki

et al. 2023

Plasma Processes & Polymers

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This work is the first systematic study of the microhardness, scratch resistance, and abrasion resistance of protective silica‐like layers deposited on polycarbonate by atmospheric pressure plasma‐enhanced chemical vapor deposition (AP PECVD) from tetraethoxysilane (TEOS) and hexamethyldisiloxane (HMDSO). The influence of the layer composition on the abovementioned mechanical properties was considered in detail. It has been found that the films deposited from HMDSO at 110°C are characterized by a microhardness value that is almost three times higher than that of the films deposited from TEOS under similar conditions. The lower carbon content and, most likely, the partial substitution of oxygen in the SiO2 matrix with carbon, leading to the formation of an oxycarbide structure, are responsible for the improved mechanical properties of the films deposited from HMDSO.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

A study of the microhardness and scratch and abrasion resistance of silica‐like coatings deposited from TEOS and HMDSO on polycarbonate by AP PECVD

Bil,

Alexandrov,

Breki

et al. 2023

Plasma Processes & Polymers

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Fabrication, Characterization, and Corrosion Protection of Siloxane Coating on an Oxygen Plasma Pre-treated Silver-Copper Alloy

Mohamed

Rifai

et al. 2023

J. of Materi Eng and Perform

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In this study, siloxane has been used for the protection of metal artifacts from corrosion in the form of transparent barrier coating films because of their good adhesion to the metal substrate. The effect of oxygen plasma pre-treatment on the adhesion properties of the siloxane thin film on the silver-copper alloy substrate was investigated. Radiofrequency plasma-enhanced chemical vapor deposition (RF-PECVD) was used for the deposition process. Surface identification and characterization of the deposited films were carried out using Scanning Electron Microscopy coupled with energy-dispersive x-ray spectroscopy (SEM–EDX) and Fourier-transform infrared spectroscopy (FT-IR). Surface topography and roughness were investigated by atomic force microscopy (AFM). The hydrophobic characteristic was measured by water contact angle measurement (WCA). The film thickness was evaluated using a spectroscopic ellipsometer (SE). Colorimetric measurement (CM) was used to evaluate changes in the appearance of the surface following the PECVD deposition of the SiO2 protective layer. The corrosion protection ability of siloxane films for metal substrates as a function of RF power and gas feed composition was examined by the electrochemical impedance spectroscopy (EIS) technique. It was found that the deposited film improved the protective efficiency for samples from 55.29 to 92.93%. Besides, after the oxygen plasma pretreatment step, the film showed better corrosion resistance of the tested samples.

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Dynamic effects in siloxane PECVD coatings

Cited by 2 publications

References 53 publications

A study of the microhardness and scratch and abrasion resistance of silica‐like coatings deposited from TEOS and HMDSO on polycarbonate by AP PECVD

A study of the microhardness and scratch and abrasion resistance of silica‐like coatings deposited from TEOS and HMDSO on polycarbonate by AP PECVD

Fabrication, Characterization, and Corrosion Protection of Siloxane Coating on an Oxygen Plasma Pre-treated Silver-Copper Alloy

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