2005
DOI: 10.1016/j.ces.2004.11.005
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Dynamics and control of thin film surface microstructure in a complex deposition process

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Cited by 23 publications
(15 citation statements)
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“…These partial differential equations are simplified by neglecting certain terms, to obtain a Langevin equation with a multidimensional Gaussian stochastic process noise term (Kardar, Parisi, & Zhang, 1986). Other authors derive similar models (Ni & Christofides, 2005). As a first step, we will try some of these models, but we will also use a cellular automata model (Prieto-Langarica, Kojouharov, & Chen-Charpentier, 2013), to model the adsorption of molecules into the surface.…”
Section: Methodsmentioning
confidence: 99%
“…These partial differential equations are simplified by neglecting certain terms, to obtain a Langevin equation with a multidimensional Gaussian stochastic process noise term (Kardar, Parisi, & Zhang, 1986). Other authors derive similar models (Ni & Christofides, 2005). As a first step, we will try some of these models, but we will also use a cellular automata model (Prieto-Langarica, Kojouharov, & Chen-Charpentier, 2013), to model the adsorption of molecules into the surface.…”
Section: Methodsmentioning
confidence: 99%
“…Then, there exist µ * > 0 and ε * > 0 such that if x f 0 2 + x s0 2 ≤ µ * and ε ∈ (0, ε * ], r f (∞) 2 , r s (∞) 2 and r(∞) 2 satisfy: (18) 45th IEEE CDC, San Diego, USA, Dec. [13][14][15]2006 WeB09.1 (20) where x f 0 and x s0 are the initial conditions for x f and x s in Eq.14, respectively, and λ cαi , λ cβ i (i = 1, 2, ··· , m) are the eigenvalues of Λ cs in the system of Eq.14.…”
Section: Analysis Of the Closed-loop Infinite-dimensional Systemmentioning
confidence: 99%
“…A methodology for feedback control of surface roughness using kMC models was developed in [12], [13] and was applied to control surface roughness in a GaAs deposition process [15]. Moreover, kMC models were also used to study the dynamics of complex deposition processes including multiple species with both short-range and longrange interactions and to perform predictive control design to control final surface roughness in [20].…”
Section: Introductionmentioning
confidence: 99%
“…The method was successfully applied to control surface roughness in a gallium arsenide (GaAs) deposition process model and to control complex deposition processes including multiple components with both short-range and long-range interactions (Ni and Christofides, 2005a). Furthermore, a method for computationally efficient optimization of thin film growth using coupled PDE and kMC models was developed (Varshney and Armaou, 2005).…”
Section: Introductionmentioning
confidence: 99%