Early stages of epitaxial growth of vanadium oxide at theTiO2(110) surface studied by photoelectron diffraction

Growth, Composition, and Structure of Ultrathin Vanadium Films Deposited on the SnO2(110) Surface

“…The V 2p 3/2 BE of the oxide is close to the value (515.2 eV) measured for vanadium oxide layers obtained by depositing vanadium on the TiO 2 (110) surface 27 in the presence of an oxygen atmosphere. A similar value of the V 2p 3/2 BE was determined for submonolayers of vanadium depositedon TiO 2 (110) and annealed at 473 K. These values were interpreted with the incorporation of vanadium in the titanium oxide matrix . A higher V 2p 3/2 BE (516.5 eV) was measured for VO 2 layers deposited on TiO 2 (110) .…”

The growth of ultrathin films of vanadium oxide on TiO2()

“…This is generally known as the metal oxide-support effect, although its exact origin and mechanism of operation are still unclear. Recently, due to the technological interest in titania-supported vanadia catalysts a number of model studies of vanadium oxide films grown on TiO 2 (1 1 0) surfaces have been undertaken [2][3][4][5][6][7][8][9][10][11][12][13][14]. Because of the possibility of different oxidation states of the V atoms, most of these studies have been focused on the influence of the oxide deposition parameters (oxygen pressure, substrate temperature, evaporation rate, reactive deposition vs. post-oxidation method, oxidising gas, etc.)…”

“…on the stoichiometry of the vanadium oxide films. Depending on the choice of these parameters, practically all bulk oxide phases of V could be prepared, including VO [9], V 2 O 3 [6][7][8], VO 2 [3][4][5]12] and V 2 O 5 [13,14]. However, concerning the structural order of the V-oxide films on TiO 2 (1 1 0), only a few studies have been published so far, reporting mainly X-ray photoelectron diffraction (XPD) [3][4][5]9] results.…”

“…Depending on the choice of these parameters, practically all bulk oxide phases of V could be prepared, including VO [9], V 2 O 3 [6][7][8], VO 2 [3][4][5]12] and V 2 O 5 [13,14]. However, concerning the structural order of the V-oxide films on TiO 2 (1 1 0), only a few studies have been published so far, reporting mainly X-ray photoelectron diffraction (XPD) [3][4][5]9] results. Since XPD is a probe, which is mainly sensitive to the local coordination sphere, the information on the long-range ordering in vanadia films is still scarce.…”

Reactivity of monolayer V2O5 films on TiO2(110) produced via the oxidation of vapor-deposited vanadium

“…Recently, in an effort to better understand the relationships between the structure and reactivity of supported vanadia catalysts several groups have studied model systems composed of vapor-deposited vanadia films supported on well-defined metal oxide single crystal surfaces including TiO 2 (110) and CeO 2 (111) [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31]. In the studies of vanadia films on TiO 2 (110) it has been found that vapor deposition of vanadium metal, either in the presence of a background of O 2 or followed by annealing in O 2 , produces vanadia films that predominantly contain V +3 or mixtures of V +3 and V +4 for O 2 pressures less than 10 -6 Torr [22,23,29].…”