Early-time hydrodynamic response of a tin droplet driven by laser-produced plasma

Hernández-Rueda, Javier; Liu, Bo; Hemminga, Diko J.; Mostafa, Yahia; Meijer, Randy; Kurilovich, Dmitry; Basko, M. M.; Gelderblom, Hanneke; Sheil, John; Versolato, Oscar

doi:10.1103/physrevresearch.4.013142

Cited by 19 publications

(13 citation statements)

References 56 publications

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“…1 By using equation (10) and referring to the related literatures [27,36], this work allows the range of parameters Ha and b to be set to   Ha 0 3 and b   0 4, respectively. Additionally, there is no special restriction on the value of the pulse width ā, which is considered to be   ā 1 4for the purpose of easy calculation and fast plotting.…”

Section: Resultsmentioning

confidence: 99%

“…The dimensionless equation (7) and its corresponding conditions (8)-( 9) can be obtained by using equation (10).…”

Section: Velocity Field Solutionmentioning

confidence: 99%

“…Microfluidics in the lab-on-a-chip (LOC) has attracted great interest from many scholars due to its wide range of applications in biomedical diagnostics, chemical analysis, DNA genetic engineering and drug delivery [1,2]. The driving mechanisms of microfluidics can be mainly classified as follows: electroosmotic driven [3], magnetic field driven [4], electromagnetic field driven [5,6], pressure driven [7], surface acoustic waves [8], bubbles [9] and laser [10]. Among the different driving mechanisms mentioned above, the electromagnetic fluid micropump has gained a lot of attention from researchers because of its simple fabrication, bi-directional flow and controllability of flow [11].…”

Section: Introductionmentioning

confidence: 99%

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Pulse electromagnetic flow of Jeffrey fluid in parallel plate microchannels

Li,

2023

Phys. Scr.

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This paper investigates the pulse electromagnetic flow of a Jeffery fluid between parallel plate microchannels, where the pulse is considered as a relatively stable and common rectangular pulse. The Laplace transform and residue theorem are employed to derive the analytical solutions for the velocity and volumetric flow rate of the pulse electromagnetic flow. Graphical representations depict the effects of several important parameters, including the Hartmann number , pulse width , relaxation time and retardation time on them. The study findings demonstrate that the Hartmann number plays a vital role in the investigation of pulse electromagnetic flow. During the first half-cycle of the pulse electric field, the magnitude of the velocity amplitude increases and then decreases with the Hartmann number . An interesting observation is that in the second half-cycle, larger Hartmann number values result in a decrease in velocity followed by a reverse increase. The profiles of velocity and volumetric flow rate exhibit oscillations over a relatively short period of time, then gradually reach a stable state with time and display periodic variation characteristics. Moreover, a larger pulse width leads to a longer variation period and more stable profiles of velocity and volumetric flow rate. For smaller Hartmann numbers , the magnitude of the volumetric flow rate amplitude grows with the relaxation time and reduces with the retardation time . However, as the Hartmann number increases, the influence of relaxation time and retardation time on the volumetric flow rate becomes significantly weakened, especially the retardation time .

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Section: Resultsmentioning

confidence: 99%

“…The dimensionless equation (7) and its corresponding conditions (8)-( 9) can be obtained by using equation (10).…”

Section: Velocity Field Solutionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Pulse electromagnetic flow of Jeffrey fluid in parallel plate microchannels

Li,

2023

Phys. Scr.

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“…More tightly focused beams lead to larger Ṙ0 (and Ṙ0 > U). Hernandez-Rueda et al [49] have explored a large parameter space to investigate the influence of the tin droplet diameter as well as the laser beam diameter and energy on the Ṙ0 /U ratio. Next, they compared the experimental U and Ṙ0 values to those obtained with detailed radiation-hydrodynamic simulations using the RALEF-2D code which in turn enabled validating analytical fluid-dynamics modeling [26].…”

Section: Laser-droplet Interaction For Tin Target Preparationmentioning

confidence: 99%

Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)

Versolato

Sheil

Witte

et al. 2022

J. Opt.

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Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-of-the-art nanolithography. Currently, CO2 lasers are used to drive the plasma. In the future, solid-state mid-infrared lasers may instead be used to eﬃciently pump the plasma. Such laser systems have promise to be more compact, better scalable, and have higher wall-plug eﬃciency. In this Topical Review, we present recent ﬁndings at the Advanced Research Center for Nanolithography (ARCNL) on using 1- and 2-µm-wavelength solid-state lasers for tin target preparation and for driving hot and dense plasma. The ARCNL research ranges from advanced laser development, over studies of ﬂuid dynamic response of droplets to impact, radiation-hydrodynamics calculations of, e.g., ion “debris”, (EUV) spectroscopic studies of tin laser-produced-plasma, to high-conversion eﬃciency operation of 2-µm-wavelength driven plasma.

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“…A low energy 1 lm wavelength "pre-pulse" laser preshapes the tin droplet into a flat target. 3,17,28 A second, high energy 2 lm "mainpulse" laser is later fired onto the tin target, generating an EUV emitting plasma. 17,27 We control the target diameter (Ø T ) impacted by the main-pulse by varying the delay time between pre-pulse and main-pulse, allowing for larger targets at longer delays.…”

mentioning

confidence: 99%

Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma

Mostafa,

Behnke,

Engels

et al. 2023

Applied Physics Letters

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We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser-produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm CO2 gas LPP currently employed in EUV lithography machines for high-volume manufacturing of semiconductor devices. High conversion efficiencies of laser light into “in-band” EUV photons up to 5.0% are achieved by homogeneously heating the plasma that is laser-generated from preshaped tin microdroplet targets. Scaling the laser pulse duration, spot size, and intensity yields a high in-band EUV energy output of up to 12.5 mJ. The EUV emission source size is studied under a similar parameter range and is shown to match typical etendues of EUV optic columns. Our findings make 2 μm LPP a particularly promising candidate to power future EUV nanolithography.

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Early-time hydrodynamic response of a tin droplet driven by laser-produced plasma

Cited by 19 publications

References 56 publications

Pulse electromagnetic flow of Jeffrey fluid in parallel plate microchannels

Pulse electromagnetic flow of Jeffrey fluid in parallel plate microchannels

Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)

Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma

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