Production of 13.5 nm light with 5% conversion efficiency from 2 <b>
                     <i>μ</i>
                  </b>m laser-driven tin microdroplet plasma

Mostafa, Y.; Behnke, L.; Engels, D. J.; Bouza, Z.; Sheil, J.; Ubachs, W.; Versolato, O. O.

doi:10.1063/5.0174149

Applied Physics Letters

2023

DOI: 10.1063/5.0174149

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Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma

Y. Mostafa,

L. Behnke,

D. J. Engels

et al.

Abstract: We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser-produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm CO2 gas LPP currently employed in EUV lithography machines for high-volume manufacturing of semiconductor devices. High conversion efficiencies of laser light into “in-band” EUV photons up to 5.0% are achieved by homogeneously heating the plasma that is laser-generated from preshaped tin microdroplet targets. Scaling the laser pulse durati… Show more

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2024

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Cited by 12 publications

References 36 publications

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Efficient extreme ultraviolet emission by multiple laser pulses

Sugiura,

Yazawa,

Morita

et al. 2024

Applied Physics Letters

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We demonstrated an efficient extreme ultraviolet (EUV) source at a wavelength of 13.5 nm using spatially separated multiple solid-state-laser pulse irradiation. The maximum conversion efficiency (CE) achieved was 3.8% for ±30° oblique laser pulse injection, which was about twice as high as that for single laser pulse irradiation of 1.7%, with an EUV source size of about 100 μm for two spatially separated laser pulses with a total laser energy of 500 mJ at a laser intensity of 2×1011 W/cm2. In addition, we achieved an EUV CE of 4.7% for ±60° oblique laser pulse injection, which was one of the highest values ever reported, in the case of a 1-μm solid-state laser-produced planar Sn target plasma by multiple laser pulse irradiation. This result suggests that multiple laser-pulse irradiation at high repetition rate operation could credibly provide the next technology for future high-power EUV sources and exposure tools toward future EUV technology nodes.

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Efficient extreme ultraviolet emission by multiple laser pulses

Sugiura,

Yazawa,

Morita

et al. 2024

Applied Physics Letters

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Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates

Babenko,

Mostafa,

Bouza

et al. 2024

AIP Advances

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We present a combined 1D imaging and broadband spectroscopy tool for analyzing laser-produced plasma sources of extreme ultraviolet light using a tapered zone plate that is dispersion-matched to a transmission grating. Specifically, we follow up on prior work [Mostafa et al. Opt. Lett. 48, 4316 (2023)] to obtain the actual spectral and spatial resolution of the imaging spectrometer and compare it to the design values. The imaging spectrometer is shown to have a spectral resolution of 1.2 nm at 13.5 nm, close to its design value, by assessing spectra obtained from carbon laser-produced plasma in a 5–180 nm wavelength band. The spatial resolution was obtained by placing slits near the object plane and back-illuminating the slit with a tin laser-produced plasma and found to be 17(5) µm, somewhat larger than the design specifications but still well within design limits for use for diagnosing plasma.

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Theoretical investigations on the radiative opacity of Sn plasmas with an open 4d orbital using a detailed-level accounting model

Yan,

Gao,

Hou

et al. 2024

Physics of Plasmas

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The radiative opacity of Sn plasmas plays a crucial role in the investigation of extreme ultraviolet (EUV) lithography. In this study, a complete atomic database of Sn4+–Sn18+ is established, and the spectrally resolved and mean opacities are investigated using a detailed-level accounting model. The energy levels and oscillator strengths are obtained in the multiconfiguration Dirac–Hartree–Fock framework. Large-scale configuration interaction calculations are performed in which the number of fine structure levels is on the order of 2 × 105 for each ionization stage. The electron correlation effects are considered to obtain accurate transition data in EUV regions. The photoionization cross sections are calculated using the distorted wave method. The spectrally resolved radiative opacities at temperatures of 5–40 eV and densities of 0.0001–1.0 g/cm3 are investigated. The spectral characteristics are demonstrated with variable temperatures and densities. The main contribution to absorption lines in the EUV region arises from Sn10+ and nearby ions, and the optimized temperatures and densities producing Sn10+ are presented. The Planck and Rosseland mean opacities are given at variable temperatures and densities, which is helpful for radiation hydrodynamic simulations of laser–Sn interactions.

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Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma

Cited by 12 publications

References 36 publications

Efficient extreme ultraviolet emission by multiple laser pulses

Efficient extreme ultraviolet emission by multiple laser pulses

Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates

Theoretical investigations on the radiative opacity of Sn plasmas with an open 4d orbital using a detailed-level accounting model

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