Abstract. We present the findings of the studies of the silicon sandwich nanostructure that represents the high mobility ultranarrow silicon quantum well of the p-type (Si-QW), 2 nm, confined by the δ-barriers, 3 nm, heavily doped with boron on the ntype Si (100) surface. The ESR studies show that nanostructured δ-barriers confining the Si-QW consist predominantly of the dipole negative-U centers of boron, which are caused by the reconstruction of the shallow boron acceptors along the <111> crystallographic axis, 2B 0 →B + + B -. The electrically ordered chains of dipole negative-U centers of boron in the δ-barriers appear to give rise to the topological edge states separated vertically, because the value of the longitudinal, G xx = 4e 2 /h, and transversal, G xy = e 2 /h, conductance measured at extremely low drain-source current indicates the exhibition of the Quantum Spin Hall effect. Besides, the Aharonov-Casher conductance oscillations and the "0.7·(2e 2 /h)-feature" obtained are evidence of the interplay of the spontaneous spin polarisation and the Rashba spin-orbit interaction that is attributable to the formation of the topological edge channels. We discuss the phenomenological model of the topological edge channel which can demonstrate the ballistic, Aharonov-Chasher effect or Josephson junction behaviour in dependence on the disorder in the distribution of the negative-U dipole centers in the upper and down δ-barriers.