Edge-induced flattening in the fabrication of ultrathin freestanding crystalline silicon sheets

Gopalakrishnan, Gokul; Czaplewski, David A.; McElhinny, Kyle M.; Holt, Martin V.; Silva-Martínez, Juan C.; Evans, Paul G.

doi:10.1063/1.4789553

Cited by 17 publications

(18 citation statements)

References 31 publications

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“…Silicon membranes with thicknesses ranging from 6 to 315 nm were fabricated from ultrathin silicon-on-insulator (SOI) wafers [31]. Improved fabrication techniques yield flat unbuckled membranes, as shown in The distribution of TDS intensity for a 315 nm-thick membrane is shown in Fig.…”

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Thermal Diffuse Scattering as a Probe of Large-Wave-Vector Phonons in Silicon Nanostructures

et al. 2013

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Large-wave-vector phonons have an important role in determining the thermal and electronic properties of nanoscale materials. The small volumes of such structures, however, have posed significant challenges to experimental studies of the phonon dispersion. We show that synchrotron x-ray thermal diffuse scattering can be adapted to probe phonons with wave vectors spanning the entire Brillouin zone of nanoscale silicon membranes. The thermal diffuse scattering signal from flat Si nanomembranes with thicknesses from 315 to 6 nm, and a sample volume as small as 5 μm(3), has the expected linear dependence on the membrane thickness and also exhibits excess intensity at large wave vectors, consistent with the scattering signature expected from low-lying large-wave-vector modes of the membranes.

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Thermal Diffuse Scattering as a Probe of Large-Wave-Vector Phonons in Silicon Nanostructures

et al. 2013

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“…2,3 A persistent challenge in advancing towards thin materials in perovskite complex oxides, however, is that lithographic processing of thin substrates can lead to low structural quality in terms of non-uniform thickness, roughness, buckling, or defect density. [4][5][6] Alternative approaches based on chemical exfoliation of large-unit-cell oxide compounds can create ultrathin substrates but have a severely limited range of compositions and crystallographic orientations. 7 In this Letter we report the creation and characterization of submicron-thickness SrTiO 3 (STO) sheets.…”

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Fabrication and convergent X-ray nanobeam diffraction characterization of submicron-thickness SrTiO3 crystalline sheets

et al. 2016

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The creation of thin SrTiO3 crystals from (001)-oriented SrTiO3 bulk single crystals using focused ion beam milling techniques yields sheets with submicron thickness and arbitrary orientation within the (001) plane. Synchrotron x-ray nanodiffraction rocking curve widths of these SrTiO3 sheets are less than 0.02°, less than a factor of two larger than bulk SrTiO3, making these crystals suitable substrates for epitaxial thin film growth. The change in the rocking curve width is sufficiently small that we deduce that dislocations are not introduced into the SrTiO3 sheets. Observed lattice distortions are consistent with a low concentration of point defects.

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“…Nanomembrane fabrication followed the using the edge-induced flattening method described in ref. [34]. The dip in the membrane profile as it leaves the ledge as shown schematically in Fig.…”

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Three-dimensional phonon population anisotropy in silicon nanomembranes

et al. 2017

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Nanoscale single-crystals possess modified phonon dispersions due to the truncation of the crystal. The introduction of surfaces alters the population of phonons relative to the bulk and introduces anisotropy arising from the breaking of translational symmetry. Such modifications exist throughout the Brillouin zone, even in structures with dimensions of several nanometers, posing a challenge to the characterization of vibrational properties and leading to uncertainty in predicting the thermal, optical, and electronic properties of nanomaterials.Synchrotron x-ray thermal diffuse scattering studies find that freestanding Si nanomembranes with thicknesses as large as 21 nm exhibit a higher scattering intensity per unit thickness than bulk silicon. In addition, the anisotropy arising from the finite thickness of these membranes produces particularly intense scattering along reciprocal-space directions normal to the membrane surface compared to corresponding in-plane directions. These results reveal the dimensions at which calculations of materials properties and device characteristics based on bulk phonon dispersions require consideration of the nanoscale size of the crystal.

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Edge-induced flattening in the fabrication of ultrathin freestanding crystalline silicon sheets

Cited by 17 publications

References 31 publications

Thermal Diffuse Scattering as a Probe of Large-Wave-Vector Phonons in Silicon Nanostructures

Thermal Diffuse Scattering as a Probe of Large-Wave-Vector Phonons in Silicon Nanostructures

Fabrication and convergent X-ray nanobeam diffraction characterization of submicron-thickness SrTiO3 crystalline sheets

Three-dimensional phonon population anisotropy in silicon nanomembranes

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