Abstract:Due to the susceptibility of Ag nanowires to external mechanical and chemical damage, maintaining high optical performance and ambient and mechanical stability during the fabrication process is important for the industrial use of Ag nanowire transparent electrodes (TEs). In this study, urethane acrylate-based photosensitive resin (UAPR) is used as the coating material for Ag nanowire TEs to improve their optical transmittance, ambient stability, and resistance to external wiping damage. In the proposed method,… Show more
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