Effect of a ZnO buffer layer on the characteristics of MgZnO thin films grown on Si (100) substrates by radio-frequency magnetron sputtering

Moon, Jung-Eun; Kim, Jun Ho; Kim, Hyung-Hoon; Lee, Ho Seong; Kim, Young Yi; Cho, Hyung Koun; Kim, Hong Seung

doi:10.1016/j.tsf.2009.01.103

Cited by 9 publications

(2 citation statements)

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“…The measured thicknesses of the layer of nanosized grains and the amorphous layer were approximately 20 and 10 nm, respectively. The amorphous layer might be SiO 2 formed by the oxidation of Si substrate at the initial stages of the PLD process, as reported in the previous work [27]. Fig.…”

Section: Resultssupporting

confidence: 56%

Direct observation of the crystal structure changes in the Mg Zn O alloy system

et al. 2015

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Section: Resultssupporting

confidence: 56%

Direct observation of the crystal structure changes in the Mg Zn O alloy system

et al. 2015

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“…The ZnO thin films have been prepared by several growth techniques, such as molecular beam deposition (MBE) 4, laser ablation 5, sputtering 6, 7 and metal organic chemical vapor deposition (MOCVD) 8, 9. In this paper, we report a comparative study between three growth techniques for the preparation of ZnO thin films with precise stoichiometric ratios and homogeneous composition distributions on Si(100) oriented substrates and glass corning using the reactive electron beam evaporation, rf magnetron sputtering, and electrostatic spray pyrolysis techniques.…”

Section: Introductionmentioning

confidence: 99%

Comparative study between zinc oxide elaborated by spray pyrolysis, electron beam evaporation and rf magnetron techniques

Khoury

Asmar

Abdallah

et al. 2010

Physica Status Solidi (a)

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Phone: 00961 1 680 250, Fax: 00961 1 681 553Zinc oxide thin films have been fabricated by spray pyrolysis, reactive e-beam, and rf magnetron sputtering techniques. Structural, optical, and electrical properties have been compared in order to clarify the characteristics of each technique. Xray diffraction measurements have shown that ZnO films deposited by reactive e-beam evaporation reveal tensile stress and ZnO thin layers deposited by magnetron sputtering and spray pyrolysis reveal compressive stress. Raman studies confirm the results obtained with XRD. Concerning the electric resistivity studies, we have seen that the layers exhibiting tensile stress are conductors whereas the films exhibiting compressive stress leads to insulators materials. The optical transmittance shows that the film evaporated by e-beam exhibits a maximum transmittance of over 60%, the film deposited by electrostatic spray pyrolysis exhibits a maximum transmittance less than 70% and the one fabricated by magnetron was found to have a maximum transparency less than 75%. Finally, the study of the surface morphology has shown that the most respected stoichiometry ratio between Zn and O was obtained using the e-beam evaporation and sputtering techniques.

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