2005
DOI: 10.1134/1.1913981
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Effect of Annealing on the Magnetic and Magnetooptical Properties of Ni Films

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Cited by 5 publications
(2 citation statements)
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“…The annealing temperature was 400 °C with an exposure time of 1 min. This temperature was chosen because it is above the Curie temperature ( = 358 °C [ 52 , 53 , 54 ]), which allows orienting the magnetization of the magnetic domains of the Ni layer along the length of the ME sample in an external magnetic field. The magnitude of the external magnetic field was 1000 Oe.…”
Section: Samplesmentioning
confidence: 99%
“…The annealing temperature was 400 °C with an exposure time of 1 min. This temperature was chosen because it is above the Curie temperature ( = 358 °C [ 52 , 53 , 54 ]), which allows orienting the magnetization of the magnetic domains of the Ni layer along the length of the ME sample in an external magnetic field. The magnitude of the external magnetic field was 1000 Oe.…”
Section: Samplesmentioning
confidence: 99%
“…The experimental results for the polycrystalline nickel (Ni) films that are fabricated using the dc mag netron sputtering were predominantly obtained for the films with the (111) texture [2,3,8,10]. It is demon strated in [11] for the Ni/Si(111) films that a variation in the potential of the Si substrate allows the fabrica tion of the Ni films with (111) or (200) textures.…”
Section: Introductionmentioning
confidence: 99%