Effect of Argon Plasma on the Float Glass Surface

Abstract

Both surfaces of a commercial float glass were treated simultaneously by a low-temperature argon plasma generated by an inductively coupled rf power supply. The effect of plasma processing on the outer surface composition of both sides of the glass was analysed by means of the ion scattering spectroscopy technique. The observed recomposition of the outer surface atoms was interpreted as a result of the action of the thermal and electric fields created by the plasma on particular glass constituents.

Plasma-Enhanced Antibody Immobilization for the Development of a Capillary-Based Carcinoembryonic Antigen Immunosensor Using Laser-Induced Fluorescence Spectroscopy

“…Plasma treatment is an efficient technique in the field of surface modifications, and our group has worked on plasma technologies for a long time. − Plasma is an ionized gas that contains charged and neutral particles, such as excited species, radicals, electrons, ions, and UV light, which can interact strongly with the surfaces of substrates, thereby producing chemical and physical modifications on surfaces. Surface exposure to plasma causes an etching effect, , which induces defects, charged surface states, , dangling bonds, and increased surface roughness. ,, There is a concomitant decrease in the contact angle of surfaces after treatment with oxygen-containing plasmas or microwave-induced argon plasma, , which suggests that the hydrophilicity of the surface might also be enhanced. Thus, the biocompatibility of the surface may be improved for tissue engineering application , or bioactive compound immobilization. , In addition, plasma exposure can introduce a wide range of different functional groups onto the surface, depending on the plasma parameters such as the power, gases used, treatment time, and pressure. , For example, oxygen-containing groups, such as C–O, CO, and O–CO, were generated on the surfaces of carbon nanotubes in a microwave-excited surface-wave Ar/O 2 plasma system with a high electron density and a low electron temperature; amino groups were introduced onto a fluoropolymer surface using a radiofrequency glow discharge ammonia plasma; carboxylic acid, alcohols, and other oxygen-containing functionalities were introduced by plasma treatments involving CO 2 , H 2 O, and CO 2 /H 2 O or H 2 /H 2 O, O 2 /H 2 O, and H 2 /O 2 ; and hydroxyl functional groups were introduced by Ar plasma pretreatment on poly(ethylene glycol) films .…”

Pinhole free thin film CdS deposited by chemical bath using a substrate reactive plasma treatment

“…In particular, sputter treatments have been shown to reduce carbon contamination and modify the resulting interface between the SnO 2 and the CdS layers. 5 Poor growth regions, appearing as pinholes, can form in the n-type CdS layer, allowing a shunt path to develop between the front contact and the p-type CdTe film. 6 Pinholes are particularly troublesome when a thin CdS layer is deposited on TCO-coated glass that has been cleaned using industry-standard techniques.…”