2014
DOI: 10.5573/jsts.2014.14.5.557
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Effect of Basal-plane Stacking Faults on X-ray Diffraction of Non-polar (1120) a-plane GaN Films Grown on (1102) r-plane Sapphire Substrates

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Cited by 11 publications
(6 citation statements)
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“…There are staking faults in the a -plane GaN which are generated during the growth procedure as a zinc blende insertion with compressive strain, they are parallel to the growth direction and hence perpendicular to the [0002] azimuth direction (Figure ). ,, It is very well known that at the interface there is a spontaneous polarization along the [0002] direction in III-nitrides. These small walls of stacking faults behave in a similar fashion and create a polarization center with a built-in electric field acting along the [0002] direction. In turn, the overall effect of the built-in electric field acting along [0002] would push the electrons toward one of the electrodes.…”
Section: Resultsmentioning
confidence: 99%
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“…There are staking faults in the a -plane GaN which are generated during the growth procedure as a zinc blende insertion with compressive strain, they are parallel to the growth direction and hence perpendicular to the [0002] azimuth direction (Figure ). ,, It is very well known that at the interface there is a spontaneous polarization along the [0002] direction in III-nitrides. These small walls of stacking faults behave in a similar fashion and create a polarization center with a built-in electric field acting along the [0002] direction. In turn, the overall effect of the built-in electric field acting along [0002] would push the electrons toward one of the electrodes.…”
Section: Resultsmentioning
confidence: 99%
“… ,, It is very well known that at the interface there is a spontaneous polarization along the [0002] direction in III-nitrides. These small walls of stacking faults behave in a similar fashion and create a polarization center with a built-in electric field acting along the [0002] direction. In turn, the overall effect of the built-in electric field acting along [0002] would push the electrons toward one of the electrodes. As the electrons will accumulate near the edge of the electrode, it will eventually reduce the Schottky barrier height.…”
Section: Resultsmentioning
confidence: 99%
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“…The XRC ω-scan was performed at phi angle intervals of 30°, where the X-ray beam was placed parallel to the c - and m -axes along the (11–20) plane at 0° and 90° phi angles, respectively. The FWHM plot exhibits the same trend as the nonpolar XRC measurements, that is, the anisotropy of nonpolar GaN results in an “M”-shaped plot with respect to the phi angle 10 , 15 , 31 . The lowest FWHMs are observed at a phi angle of 0°, corresponding to 1224, 1044, 864 and 756 arcsec for samples S1, S2, S3 and S4, respectively.…”
Section: Resultsmentioning
confidence: 53%
“…However, the growth of a -plane GaN on foreign substrates has been hindered thus far by the formation of high densities of basal stacking faults (BSFs) and threading dislocations (TDs) during the growth process 9 , 10 . The anisotropic properties of nonpolar GaN have become the main challenge in growing a -plane GaN.…”
Section: Introductionmentioning
confidence: 99%