Effect of bias voltage on microstructure and nanomechanical properties of Ti films

Yinglong, Liu; Liu, Fang; Wu, Qian; Chen, Aiying; Li, Xiang; Pan, Deng

doi:10.1016/s1003-6326(14)63420-8

Cited by 18 publications

(4 citation statements)

References 22 publications

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“…Polydiagnostic discharge characterization, including time-resolved in-situ current measurements (by using current probes), timeaveraged ion energy distribution measurements (by mass spectrometry), as well as two-dimensional ground state ion density mapping (using laser imaging), is implemented in this study for the sake of a deeper understanding of the discharge physics. Special accents are made on the role of electrical parameters for ion control as well as on the comparison of the obtained trends with DCMS discharges [24].…”

Section: Introductionmentioning

confidence: 99%

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

Michiels¹,

Snyders²,

Britun³

2020

J. Phys. D: Appl. Phys.

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Ion acceleration in a bipolar high-power impulse magnetron sputtering discharge working with Ar gas and using a Ti cathode has been investigated. The multiple discharge diagnostic approaches have been implemented, including the target and substrate current probe measurements, mass spectrometry and laser-induced fluorescence. In particular, the current waveforms were analysed in detail, showing the particularities of the current evolution during the negative (plasma) and positive voltage pulses. It is shown that the substrate current during the positive voltage pulse reveals two peaks, corresponding, as suggested, to two groups of the positive ions repulsed from the cathode by the applied positive potential. These observations correlate well with the mass spectrometry measurements as well as with the two-dimensional ion density mapping performed for several discharge conditions by laser-induced fluorescence imaging technique.

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Section: Introductionmentioning

confidence: 99%

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

Michiels¹,

Snyders²,

Britun³

2020

J. Phys. D: Appl. Phys.

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“…It is known that quite a few factors will affect the measured hardness of a deposited film, such as sputtering power, bias voltage, and even the (nano)indentation techniques used to measure hardness. There is limited published literature on the hardness of pure Ti films; however, in a few publications, the reported hardness of Ti-films varies from 2.4~10 GPa depending on the deposition method, coating thickness and crystallographic orientation [20,[38][39][40][41][42][43][44][45]. It is also noticeable that DCMS sputtered films being found to have a lower hardness (~8GPa) than EB-evaporated films (~10GPa) in the study of Arshi et al [45] .…”

Section: Film Hardnessmentioning

confidence: 99%

Deposition of titanium films on complex bowl-shaped workpieces using DCMS and HiPIMS

Xie¹,

Wei²,

Liu³

et al. 2022

Surface and Coatings Technology

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“…Moreover, Ti-based metal films prepared using magnetron sputtering have also attracted interest. Several works have reported the microstructure of pure Ti film (α-Ti, hcp), which is related to the sputtering parameters including target power, bias and deposition temperature [7][8][9][10][11][12]. In recent years, β-Ti alloys (bcc) have gained increasing attention due to their excellent strength and rigid combinations.…”

Section: Introductionmentioning

confidence: 99%

Microstructure and Mechanical Properties of Co-Deposited Ti-Ni Films Prepared by Magnetron Sputtering

Zhang

et al. 2023

Coatings

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Ti-Ni films with various Ni contents (16.5, 22.0, 33.5 at. %) were deposited on Al alloy substrates using DC magnetron co-sputtering. The effects of Ni target power and substrate bias (−10, −70, −110 V) on morphologies, crystallography, nanomechanical properties and scratch behavior of films were studied. All the deposited Ti-Ni films exhibited a BCC structure of β-Ti (Ni). The Ti-Ni films grew with a normal columnar structure with good bonding to substrates. When increasing the Ni target power and substrate bias, the grain size grew larger and the surface became denser. The as-deposited Ti-Ni films significantly improved the hardness (>4 GPa) of the Al alloy substrate. With the increase of bias voltage, the hardness and modulus of the film increased. The hardness and modulus of the Ti-22.0Ni film prepared at −70 V bias were 5.17 GPa and 97.6 GPa, respectively, and it had good adhesion to the substrate.

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Effect of bias voltage on microstructure and nanomechanical properties of Ti films

Cited by 18 publications

References 22 publications

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

Deposition of titanium films on complex bowl-shaped workpieces using DCMS and HiPIMS

Microstructure and Mechanical Properties of Co-Deposited Ti-Ni Films Prepared by Magnetron Sputtering

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