Abstract:Chromium‐doped titanium nitride thin films are deposited using RF/DC reactive magnetron co‐sputtering technique. Optical, chemical, surface morphology and magnetic properties of the deposited films are studied using spectrophotometry, X‐ray photoelectron spectroscopy, atomic force microscopy, and vibrating sample magnetometry, respectively. Films are prepared with different concentration of chromium by adjusting the sputtering power of magnetron using chromium target. A redshift in the bandgap of Cr‐TiN films … Show more
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