Radical
photopolymerization (RPP) has grown into a multibillion-dollar technology
for reduced energy consumption and waste with increased productivity.
However, radical-mediated polymerization ceases almost immediately
following discontinuation of irradiation because of rapid termination
of reactive centers. This restricts the wider use of RPP in applications
that involve light attenuation or irregular surfaces because uniform
polymerization is not guaranteed for these challenging exposure conditions
and the resultant undercuring leads to compromised material properties
and harmful leachable monomers. Herein, we developed a unique radical
dark-curing photoinitiator (DCPI) that continues its polymerization
beyond the cessation of irradiation. The DCPI achieved a remarkable
25–60% additional conversion over a 1 h period, when light
was shuttered at 20% conversion, compared to the 1–3% additional
conversion achieved by a Norrish type II control photoinitiator. We
elucidated the origin of the high photon efficiency using computational
studies and experiments, which suggest that the DCPI may be the most-photon-efficient
photoinitiator to date. We also demonstrated that the mechanical properties
of dark-cured polymer are similar to and even exceed those of the
corresponding polymer obtained by extended photocuring. In particular,
the initial 0.1 MPa storage modulus continuously developed to 4.3
MPa without further irradiation, while also exhibiting ∼30%
less shrinkage stress than the full exposure control. With its superior
photo- and dark-polymerization efficiency, the DCPI enhances the performance
of many existing RPP processes while extending RPP to heretofore unattainable
applications. The DCPI accomplishes such a performance through an
inherent automatic rectification of initially undercured regions and
defies the RPP paradigm that light dosage directly correlates to conversion.