Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Structural, Nanomechanical, and Field Emission Properties of Amorphous Carbon Films Having Embedded Nanocrystallites Deposited by Filtered Anodic Jet Carbon Arc Technique

“…Thus, the area under these curves directly gives the amount of the sp 3 and sp 2 contents. The observed peak positions for deconvoluted component are well matched with the value reported in the literature [34,35]. Figure 5 shows the variation of C1s, FWHM, sp 3 , and sp 2 obtained in a-C:nc films versus negative substrate biases.…”

Chemical Bonding in Composite SiNx/Diamond-Like Carbon Films Prepared by Filter Cathodic Arc Deposition of Graphite Incorporated with Radio Frequency Sputtering of Silicon Nitride

“…12) Filtered cathodic vacuum arc (FCVA) deposition has been proved to be the most promising technique for preparing high-quality ta-C films with sp 3 contents of more than 80%. 8,11,[13][14][15][16][17][18][19] Recently, different amorphous hydrogenated Si-based films, such as a-Si, a-SiN x , a-SiC x , and a-SiC x N y , have been firstly studied as the underlayers of DLC films by Azzi et al 20) They reported that a-SiN x /DLC films were the most promising combination. Consequently, Wang et al 19) reported silicon nitride (Si-Ni) gradient films firstly prepared by nitriding Si thin films as the underlayer of ta-C films.…”

Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride

“…Various techniques have been used for the deposition of DLC films. However, the filtered cathodic vacuum arc (FCVA) has been proved to be the most promising technique for the deposition of high quality DLC films with sp 3 contents of more than 80% and results in high hardness and chemical inertness [12,[14][15][16][17][18].…”