2022
DOI: 10.1088/1361-6595/ac942b
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Effect of electron energy distributions on the electron density in nitrogen inductively coupled plasmas

Abstract: The effect of the electron energy distribution function (EEDF) on the behavior of the electron density (ne) is investigated under various gas pressures of nitrogen (N2) in inductively coupled plasma (ICP) operated at low and high input powers. A Langmuir probe is used to measure the EEDFs and electron densities, and the antenna coil current is measured to obtain the absorbed power in the plasma (Pabs). At gas pressures above 2.67 Pa (20 mTorr) and 2500 W, Pabs increases continually with increasing the gas pres… Show more

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Cited by 3 publications
(5 citation statements)
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“…As the Ar concentration increases from 10% to 50%, the EEPF curve shifts from non-Maxwellian to bi-Maxwellian distribution, and thereafter the EEPF again becomes Maxwellian type when the Ar reaches 80%. With the increase in Ar concentration, the electron density also increases and that is the reason that at a lower Ar percentage the EEPF takes the form of a non-Maxwellian distribution, and thereafter, as Ar concentration grows, the EEPF starts approaching the Maxwellian form [29,46].…”
Section: Lp Measurementsmentioning
confidence: 99%
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“…As the Ar concentration increases from 10% to 50%, the EEPF curve shifts from non-Maxwellian to bi-Maxwellian distribution, and thereafter the EEPF again becomes Maxwellian type when the Ar reaches 80%. With the increase in Ar concentration, the electron density also increases and that is the reason that at a lower Ar percentage the EEPF takes the form of a non-Maxwellian distribution, and thereafter, as Ar concentration grows, the EEPF starts approaching the Maxwellian form [29,46].…”
Section: Lp Measurementsmentioning
confidence: 99%
“…Here, τ stands for the electron residence time. The equation that governs the relationship among ν ee , electron density (n e ) and electron temperature (T e ) is represented as [29,45] ν ee = 2.91 × 10 (…”
Section: Lp Measurementsmentioning
confidence: 99%
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