Effect of Energy Dependence of Primary Beam Divergence on the X-ray Standing Wave Characterization of Layered Materials

Tiwari, M. K.; Naik, S.R.; Lodha, G. S.; Nandedkar, R. V.

doi:10.2116/analsci.21.757

Cited by 11 publications

(6 citation statements)

References 33 publications

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“…The normalized x-ray field intensity I j (θ, Z ) in layer j of a multilayer structure consisting of n layers, at depth Z is given by [15]…”

Section: Theoretical Backgroundmentioning

confidence: 99%

“…The microstructural properties such as layer thickness, interface roughness, interlayer formation etc of the layered materials is usually determined from the x-ray reflectivity (XRR) [8], x-ray diffuse scattering [9] and from the x-ray standing wave (XSW) induced fluorescence measurements [10][11][12][13][14][15]. The XRR technique, in combination with the x-ray diffuse scattering measurements, has shown to be a very powerful technique for the determination of correlated and un-correlated (random) interfacial roughness effects in a multilayer stack [16][17][18].…”

Section: Introductionmentioning

confidence: 99%

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Structural characterization of thin layered materials using x-ray standing wave enhanced elastic and inelastic scattering measurements

Tiwari¹,

Sawhney²

2010

J. Phys.: Condens. Matter

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By measuring the intensities of the x-ray standing wave induced elastic and inelastic x-ray scattering from thin multilayer structures, we show that structural characterizations of the high and low z (atomic number) material layers can be performed independently. The method has been tested by analyzing the structural properties of an Nb/C/Nb trilayer and an Mo/Si periodic multilayer structure. The results of the x-ray scattering measurements have been compared with those obtained using x-ray reflectivity and conventional x-ray standing wave fluorescence techniques. It has been demonstrated that the present approach is especially suitable for studying multilayer structures comprising low atomic number layers, as it eliminates the requirement of a fluorescence signal, which is very weak in the case of low z materials.

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“…The normalized x-ray field intensity I j (θ, Z ) in layer j of a multilayer structure consisting of n layers, at depth Z is given by [15]…”

Section: Theoretical Backgroundmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Structural characterization of thin layered materials using x-ray standing wave enhanced elastic and inelastic scattering measurements

Tiwari¹,

Sawhney²

2010

J. Phys.: Condens. Matter

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“…To the best of our knowledge no reports show XSW measurements on Co/Si system to study the nature of its interface. For the theoretical fitting [18] of this data, we have considered two models.…”

Section: X-ray Standing Wavementioning

confidence: 99%

Effect of Si layer thickness on the structural properties of a Co/Si multilayer system

Jaiswal

Rai

Tiwari

et al. 2006

J. Phys.: Condens. Matter

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The nature of the interface involved and the structure characteristics of the as-deposited Co/Si multilayer system have been studied. Using the ionbeam sputtering technique, multilayers, having ten bilayers of Co and Si, were deposited. X-ray reflectivity, x-ray standing wave and wide-angle x-ray diffraction techniques were used to study the interface of the system. The x-ray reflectivity curves obtained confirm the good quality of the Co/Si stack. The presence of a silicide layer at the interface is not distinctly visible. The Co is found to be crystalline in nature and it is highly textured. This texture of the Co layer is lost as the Si layer thickness is increased above a particular value. We have performed some preliminary magneto-optical Kerr effect (MOKE) measurements at room temperature, which show that all the samples have ferromagnetic coupling between the different Co layers and that the nature of ferromagnetism is highly governed by the Si layer thickness.

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“…The normalized X-ray field intensity I j (θ , Z), in layer j, of a multilayer structure, at depth Z is given by [20] :…”

Section: Theoretical Backgroundmentioning

confidence: 99%

Characterization of trace embedded impurities in thin multilayer structures using synchrotron X‐ray standing waves

Tiwari

Sawhney

Lodha

2010

Surface & Interface Analysis

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X-ray standing wave (XSW) field generated under Bragg reflection condition in a periodic Mo/Si multilayer structure has been used to determine the concentration and location of various trace element contaminants embedded in different layers of that multilayer structure. We have used intense synchrotron X rays for XSW analysis. It is observed that various trace element impurities such as Cr, Fe, Ni and W get embedded unintentionally in the multilayer structure during the deposition process. Consequences of such impurity incorporation on the optical properties of the multilayer structure are discussed in hard and soft X-ray regions. Present measurements are important in order to optimize the deposition methods on one hand and to better correlate the measured optical properties of a multilayer structure with theoretical models on the other.

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Effect of Energy Dependence of Primary Beam Divergence on the X-ray Standing Wave Characterization of Layered Materials

Cited by 11 publications

References 33 publications

Structural characterization of thin layered materials using x-ray standing wave enhanced elastic and inelastic scattering measurements

Structural characterization of thin layered materials using x-ray standing wave enhanced elastic and inelastic scattering measurements

Effect of Si layer thickness on the structural properties of a Co/Si multilayer system

Characterization of trace embedded impurities in thin multilayer structures using synchrotron X‐ray standing waves

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