1994
DOI: 10.1021/la00024a033
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Effect of Gold Topography and Surface Pretreatment on the Self-Assembly of Alkanethiol Monolayers

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Cited by 95 publications
(90 citation statements)
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“…Resulting films were annealed for between 4 and 16 hours after evaporation at 300 C. The sample was cooled under vacuum to less than 60 C prior to removal from the evaporation chamber. This procedure was used to decrease mica impurities and promote preferential epitaxial gold growth of the Au (111) face [24].…”
Section: Au-mica Annealedmentioning
confidence: 99%
“…Resulting films were annealed for between 4 and 16 hours after evaporation at 300 C. The sample was cooled under vacuum to less than 60 C prior to removal from the evaporation chamber. This procedure was used to decrease mica impurities and promote preferential epitaxial gold growth of the Au (111) face [24].…”
Section: Au-mica Annealedmentioning
confidence: 99%
“…Hence, the purity of the gold surface appears to be more important than its smoothness. 49 Both requirements are met by evaporated or sputtered gold films (typically 50 -200 nm thick) on glass, silicon or cleaved mica substrates. To improve the adhesion of the gold film to the oxide surface, a thin (1 -5 nm) layer of chromium or titanium is often deposited first.…”
Section: Substrate Choice and Preparationmentioning
confidence: 99%
“…Depending on the purpose, the superficial gold oxides formed during these steps are chemically reduced by alcohols, normally with ethanol [4, 24 -26]. After these procedures, thermal or electrochemical steps are commonly performed in order to smooth and promote to the electrode an active surface [16,32].…”
Section: Introductionmentioning
confidence: 99%