Effect of HF etching on the surface quality and laser-induced damage of fused silica

Zheng, Zhi; Zu, Xiaotao; Jiang, Xiaodong; Xi, Xiang; Huang, Jin; Zhou, Xinda; Li, Chunhong; Zheng, Wanguo; Li, Li

doi:10.1016/j.optlastec.2011.10.013

Cited by 39 publications

(23 citation statements)

References 30 publications

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“…It can be concluded that etching has little effects on mechanical properties because the hardness and Young's modulus are constant, 8.5±0.5 GPa and 65±5 GPa, which is different from the results reported by other researchers [9] .…”

Section: Fig3 Mechanical Properties Of Fused Silica Treated In Hf Acidcontrasting

confidence: 86%

Improving UV laser damage threshold of fused silica optics by wet chemical etching technique

Li²,

Yuan³

et al. 2015

Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers

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Fused silica is widely used in high-power laser systems because of its good optical performance and mechanical properties. However, laser damage initiation and growth induced by 355 nm laser illumination in optical elements have become a bottleneck in the development of high energy laser system. In order to improve the laser-induced damage threshold (LIDT), the fused silica optics were treated by two types of HF-based etchants: 1.7%wt. HF acid and buffer oxide etchant (BOE: the mixture of 0.4%wt. HF and 12%wt. NH 4 F), respectively, for varied etching time. Damage testing shows that both the etchants increase the damage threshold at a certain depth of material removal, but further removal of material lowers the LIDT markedly. The etching rates of both etchants keep steady in our processing procedure, ~58 μg/min and ~85 μg/min, respectively. The micro-surface roughness (RMS&PV) increases as etching time extends. The hardness (H) and Young's modulus (E) of the fused silica etched for diverse time, measured by nano-indenter, show no solid evidence that LIDT can be related to hardness or Young's modulus.

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Section: Fig3 Mechanical Properties Of Fused Silica Treated In Hf Acidcontrasting

confidence: 86%

Improving UV laser damage threshold of fused silica optics by wet chemical etching technique

Li²,

Yuan³

et al. 2015

Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers

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show abstract

“…This is at a sufficient level for many optical applications. From the findings it can be concluded that plasma jet polishing heals microcracks buried in the near-surface region located below the Beilby layer [4].…”

Section: Pjm Etching Characteristicsmentioning

confidence: 94%

“…Alternatively, the method should be capable to even improve the roughness. It is well known from many investigations of HF wet etching or reactive plasma etching of fused silica using highly reactive species that a characteristic surface roughness evolves [3,4]. High spatial frequency structures occur in strong dependence on initial surface roughness, chemical contaminants, or sub-surface damage (SSD), since fluorine atom attack on the surface is highly selective.…”

Section: Pjm Etching Characteristicsmentioning

confidence: 99%

New Freeform Manufacturing Chains based on atmospheric Plasma Jet Machining

Arnold

Boehm

Paetzelt

2016

J. Eur. Opt. Soc.-Rapid Publ.

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New manufacturing chains for precise fabrication of asphere and freeform optical surfaces including atmospheric Plasma Jet Machining (PJM) technology will be presented. PJM is based on deterministic plasma-assisted material removal. It has the potential for flexible and cost-efficient shape generation and correction of small and medium-sized optical freeform elements. The paper discusses the interactions between the plasma tools and optical fused silica samples in the context of the pre-machined and intermediate surface states and identifies several plasma jet machining methods for freeform generation, surface correction, and finishing as well as suitable auxiliary polishing methods. The successful application of either processing chain is demonstrated.

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“…Hence, it has been one of the major focuses in research on how to improve damage resistance and lifetime of fused silica optics in the past decades. The methods such as wet chemical etching, plasma and ion beam etching, UV and CO2 laser treatments [5][6][7][8] have been reported to effectively improve the laser-induced damage threshold (LIDT) of the fused silica optics. However, the LIDT value of the fused silica surface is still much lower than the dielectric breakdown threshold of the bulk material mainly due to the surface and subsurface defects.…”

Section: E-mail Addressesmentioning

confidence: 99%

Improved laser induced damage thresholds of Ar ion implanted fused silica at different ion fluences

Liao

et al. 2019

Applied Surface Science

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Effect of HF etching on the surface quality and laser-induced damage of fused silica

Cited by 39 publications

References 30 publications

Improving UV laser damage threshold of fused silica optics by wet chemical etching technique

Improving UV laser damage threshold of fused silica optics by wet chemical etching technique

New Freeform Manufacturing Chains based on atmospheric Plasma Jet Machining

Improved laser induced damage thresholds of Ar ion implanted fused silica at different ion fluences

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