Effect of N2 partial pressure on the microstructure and mechanical properties of magnetron sputtered CrNx films

Han, Zhizhong; Tian, Jiawan; Lai, Qianxi; Yu, Xinge; Li, Geyang

doi:10.1016/s0257-8972(02)00667-9

Cited by 83 publications

(50 citation statements)

References 10 publications

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“…• (2θ) was observed that may possibly be assigned to the CrN (200) orientation [21,25]. Both phases are according to the literature thermodynamically stable [21].…”

Section: Bulk and Surface Characteristics Of Nonexposed Powdersmentioning

confidence: 69%

“…As a consequence, this powder resulted in the largest measured surface area, 1.26 m 2 /g. Cr 2 N was identified as the predominant crystalline phase of the Cr-N powder according to the GI-XRD investigation [21,25,32]. In addition, a weak reflection 43.6…”

Section: Bulk and Surface Characteristics Of Nonexposed Powdersmentioning

confidence: 99%

“…Chromium carbide (Cr 3 C 2 ) has been shown to be practically insoluble in boiling HCl [12] whereas Cr 2 N was shown to have higher solubility in HCl compared with CrN [13]. In addition, surface and bulk characteristics of both chromium carbide and chromium nitride have been carefully examined with techniques such as XPS, SEM, and XRD [21][22][23][24][25].…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Chemical Stability of Chromium Carbide and Chromium Nitride Powders Compared with Chromium Metal in Synthetic Biological Solutions

2012

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Chromium carbide (Cr-C) and chromium nitride (Cr-N) powders were compared with a chromium metal powder (Cr-metal) to evaluate their chemical stability in solution. All three powders were exposed in five different synthetic biological solutions of varying pH and chemical composition simulating selected human exposure conditions. Characterisation of the powders, using GI-XRD, revealed that the predominant bulk crystalline phases were Cr7C3 and Cr2N for Cr-C and Cr-N respectively. The outermost surface of Cr-C, determined by XPS, contained Cr7C3 and Cr2O3 and the corresponding measurement on Cr-N revealed Cr2N and CrN apart from Cr2O3. The presence of Cr2O3 was verified by XPS investigations of the Cr-metal powder. The mean particle size was similar for Cr-metal and Cr-N but slightly smaller for Cr-C. All three powders were poorly soluble and released very low amounts of chromium (<0.00015 μg Cr/μg loaded particles) independent on test solution. Slightly higher chromium concentrations were determined in the more acidic media (pH 1.7 and 4.5) compared with the near-neutral solutions (pH 7.2 and 7.4). Cr-C released the lowest amount of Cr despite having the largest surface area a feature attributed to the strong covalent bonds within the matrix.

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“…• (2θ) was observed that may possibly be assigned to the CrN (200) orientation [21,25]. Both phases are according to the literature thermodynamically stable [21].…”

Section: Bulk and Surface Characteristics Of Nonexposed Powdersmentioning

confidence: 69%

Section: Bulk and Surface Characteristics Of Nonexposed Powdersmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Chemical Stability of Chromium Carbide and Chromium Nitride Powders Compared with Chromium Metal in Synthetic Biological Solutions

2012

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“…The mechanical and tribological properties of the CrN coating deposited under different ratios of sputtering gas and reactive gases are reported in the literature [19][20][21][22][23]. Olaya et al [24] noted that the RF bias voltage influenced the crystal orientation and hardness of the deposits.…”

Section: Introductionmentioning

confidence: 99%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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Chromium Nitride (CrN) thin films are known for their comparatively good mechanical properties. CrN was deposited on Silicon (100) and glass substrates by using DC magnetron sputtering and the influence of the partial nitrogen content and different gaseous environment on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM), Atomic Force Microscopy (AFM) and Nanoindentation was used to characterise the structural and mechanical properties of the deposited thin film. The films showed the [200] preferred orientation at lower (at 20%) nitrogen contents while the intensity of the peak [111] increases with the increase in the nitrogen content. The Cr2N (220) peak was identified at a nitrogen content above 30%, but for nitrogen content above 40%, the CrN phase was observed in both films deposited on Si(100) and glass substrates. The preferred orientations of the CrN thin films are strongly influenced by the nitrogen content inside the chamber as observed in the present work. The surface roughness and deposition rate were observed in a reducing trend with the increasing N2 content and temperature from 20.31 to 2.71nm and from 30.16 nm/min to 25.66nm/min, respectively. The hardness and modulus of pure N2 films deposited on the Si substrates were evaluated by nanoindentaion testing and indicated 31 GPa and 250 GPa, respectively.

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“…The deposition rates of the films decrease dramatically in a pure reactive N 2 atmosphere. This is partly due to the poor sputtering capability of nitrogen compared to argon and partly from the target poisoning effects (induced by the reactive N 2 atmosphere) where the sputtering yield for nitride is much smaller than the metal, and partly due to that these compounds have higher secondary electron emission yields than metal targets [19]. The additional Ar can dramatically increase the sputtering of Cu and Cu 3 N and have a negative influence of forming nitride compound layer on the target surface and consequently results in a large increase of the deposition rate.…”

Section: Film Deposition and Structurementioning

confidence: 99%

Structure and Thermal Stability of Copper Nitride Thin Films

Zhang

et al. 2013

Indian Journal of Materials Science

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Copper nitride (Cu 3 N) thin films were deposited on glass via DC reactive magnetron sputtering at various N 2 flow rates and partial pressures with 150 ∘ C substrate temperature. X-ray diffraction and scanning electron microscopy were used to characterize the microstructure and morphology. The results show that the films are composed of Cu 3 N crystallites with anti-ReO 3 structure. The microstructure and morphology of the Cu 3 N film strongly depend on the N 2 flow rate and partial pressure. The cross-sectional micrograph of the film shows typical columnar, compact structure. The thermal stabilities of the films were investigated using vacuum annealing under different temperature. The results show that the introducing of argon in the sputtering process decreases the thermal stability of the films.

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Effect of N2 partial pressure on the microstructure and mechanical properties of magnetron sputtered CrNx films

Cited by 83 publications

References 10 publications

Chemical Stability of Chromium Carbide and Chromium Nitride Powders Compared with Chromium Metal in Synthetic Biological Solutions

Chemical Stability of Chromium Carbide and Chromium Nitride Powders Compared with Chromium Metal in Synthetic Biological Solutions

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Structure and Thermal Stability of Copper Nitride Thin Films

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