“…Commonly used methods to incorporate dopants into the vacuum processed absorber layers include i) dopant diffusion from substrates, for example, SLG and Mo:Na substrates, [63,139,195] ii) pre-deposition, that is, deposition of dopant metals before absorber film deposition (e.g., Al 2 O 3 substrate with a Mo/NaF layer, [196] ) iii) in situ co-evaporation (gas phase doping, i.e., the dopant compound (e.g., NaF, KF) is evaporated during absorber deposition), and iv) PDTs (i.e., the deposited absorber is annealed with the dopant element/compound (e.g., alkali halides) and Se vapor, without breaking the vacuum (see Figure 6). [59,120,125,141] PDTs have been used to incorporate both heavy (e.g., K, Rb, Cs), [127,197] and light (e.g., Na, Li), [127,197] dopant atoms into the CIGSSe absorber layer, and have been scaled for production of large-area modules, illustrating their feasibility and industrial scalability. [198] Among the alkali halide salts, alkalifluorides are commonly employed owing to the high stability of the fluorine ion (F − ), and the compound's thermal decomposition facilitated by selenium, to volatile SeF 6 or SeF 2 which desorb from the CIGSSe surface thereby limiting halide contamination.…”