2006
DOI: 10.1063/1.2404942
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Effect of Nd dopant on magnetic and electric properties of BiFeO3 thin films prepared by metal organic deposition method

Abstract: Polycrystalline Bi1−xNdxFeO3 (x=0–0.15) thin films were prepared on (111) Pt∕Ti∕SiO2∕Si substrates via metal organic deposition method. The effect of Nd dopant on the structural, electric, and magnetic properties was studied. It was found that the ferroelectric polarization and saturation magnetization of the films were enhanced by appropriate Nd doping due to the structural distortion and the suppressed cycloidal spin structure. Meanwhile, Nd-doped BiFeO3 thin films exhibited magnetic anisotropy because of th… Show more

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Cited by 253 publications
(119 citation statements)
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“…The first transition observed around 500 K is attributed to a transient interaction between oxygen ion vacancies and Fe 3+ /Fe 2+ . The replacement of some volatile Bi 3+ with non-volatile Re 3+ might have prevented the oxygen ion vacancies stabilizing Fe 3+ /Fe 2+ couple-oxygen vacancy interaction [27][28][29]. As BiFeO 3 is known to exhibit antiferromagnetic transition (T N ) at 643 K and a ferroelectric transition at 1103 K, the transitions observed in BFO, BLFO and BYFO at 645, 693 and 673 K, respectively, may also be attributed to the onset of antiferromagnetism in these materials.…”
Section: Dielectric Constantmentioning
confidence: 99%
“…The first transition observed around 500 K is attributed to a transient interaction between oxygen ion vacancies and Fe 3+ /Fe 2+ . The replacement of some volatile Bi 3+ with non-volatile Re 3+ might have prevented the oxygen ion vacancies stabilizing Fe 3+ /Fe 2+ couple-oxygen vacancy interaction [27][28][29]. As BiFeO 3 is known to exhibit antiferromagnetic transition (T N ) at 643 K and a ferroelectric transition at 1103 K, the transitions observed in BFO, BLFO and BYFO at 645, 693 and 673 K, respectively, may also be attributed to the onset of antiferromagnetism in these materials.…”
Section: Dielectric Constantmentioning
confidence: 99%
“…[4][5][6][7][8][9][10][11]15 The site-engineering technique is quite important from industrial aspects because this technique can be applied to most deposition methods. However, it is not easy to reduce the leakage current of BFO films by a single ion-doping method since the excess substitution causes an increase in leakage current in the films.…”
mentioning
confidence: 99%
“…6,7 Besides, modification of electrical properties of BFO films by ion doping at Bi site is quite difficult because of the degradations in ferroelectric properties, although rare-earth elements doped at Bi site is effective to reduce the impurity phases due to bismuth and oxygen vacancies. 5,8,9 Therefore, we propose a new combination of Mn and Ti as codoping elements for Fe site of BFO thin films. In this work, we report the synthesis and characterization of ͑Mn, Ti͒-codoped BFO ͑BFMT͒ thin films by comparing with those of pure BFO, Ti-doped BFO ͑BFT͒, and Mn-doped BFO ͑BFM͒ thin films.…”
mentioning
confidence: 99%
“…Dzyaloshinskii-Moriya (DM) interaction is the possible mechanism for this weak ferromagnetism. The DM interaction [27][28][29] in these samples is enhanced by the increased rotation of distorted FeO 6 octahedra with increase in ionic radii of the dopant. This is confirmed by the change in the bond angle and bond distances.…”
Section: Magnetic Propertiesmentioning
confidence: 94%