Effect of Oxygen Gas Addition on Preparation of Iridium and Platinum Films by Metal-Organic Chemical Vapor Deposition

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

“…10. 123 One can see mirror-like thin lms can be grown in a wide range of temperatures at low deposition pressures, but range of temperatures is compressed as a result of pressure increase, making probability of gas-phase powdery deposits appearance much higher. Oxygen gas addition decreased signicantly the deposition rates at higher temperatures which is explained by the formation of volatile metal oxide species and/or homogeneous gas phase reactions.…”

Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium

“…17) Iridium films prepared without oxygen addition invariably contained carbon. TEM observations revealed that the films consisted of iridium clusters (1-4 nm in diameter) surrounded by amorphous carbon.…”

Overview of Coating Growth Mechanisms in MOCVD Processes as Observed in Pt Group Metals

“…Precursor choice: Due to the high catalytic activity of platinum metals and the high cost of Pt group metalbased compounds, the chosen precursors must be able to achieve a transformation degree of at least 60 to 80 % for the whole sequence of conversions; metal -initial salt -precursor -purification -gas phase transport to the substrate -thermal decomposition -coating. It has been shown earlier, based on the analysis of literature data, [7][8][9][10][11][12][13][16][17][18][19][20][21][22][23][24][25] and on our experiments, that at this time, b-diketonates of platinum metals best meet this whole set of requirements. 3.…”